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Extended dual-grating alignment method for optical projection lithography
Wangfu Chen; Wei Yan; Song Hu; Yong Yang; Shaolin Zhou
Source PublicationApplied Optics
Volume49Issue:4Pages:708-713
2010
Language英语
Subtype期刊论文
AbstractSince accurate alignment is essential for projection lithography, an extended dual-grating based alignment scheme is proposed. This method is an extension of the basic dual-grating alignment model, the mechanism of which is explained to make it clear how the extended scheme performs in projection lithography. The framework of the extended alignment scheme for projection lithography is constructed, and the process of key parameter determination is then detailed. In both cases, a tiny shift of the wafer during the alignment process can be resolved by a conspicuous displacement or phase variation of corresponding fringes. Analytical results indicate that alignment is independent of the gap between wafer and mask, disturbance from the fluctuation in illumination can be neglected, and alignment resolution in subnanometers can be realized with this scheme.; Since accurate alignment is essential for projection lithography, an extended dual-grating based alignment scheme is proposed. This method is an extension of the basic dual-grating alignment model, the mechanism of which is explained to make it clear how the extended scheme performs in projection lithography. The framework of the extended alignment scheme for projection lithography is constructed, and the process of key parameter determination is then detailed. In both cases, a tiny shift of the wafer during the alignment process can be resolved by a conspicuous displacement or phase variation of corresponding fringes. Analytical results indicate that alignment is independent of the gap between wafer and mask, disturbance from the fluctuation in illumination can be neglected, and alignment resolution in subnanometers can be realized with this scheme.
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7232
Collection微电子装备总体研究室(四室)
Corresponding AuthorWangfu Chen
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
Wangfu Chen,Wei Yan,Song Hu,et al. Extended dual-grating alignment method for optical projection lithography[J]. Applied Optics,2010,49(4):708-713.
APA Wangfu Chen,Wei Yan,Song Hu,Yong Yang,&Shaolin Zhou.(2010).Extended dual-grating alignment method for optical projection lithography.Applied Optics,49(4),708-713.
MLA Wangfu Chen,et al."Extended dual-grating alignment method for optical projection lithography".Applied Optics 49.4(2010):708-713.
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