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题名:
Design and application of phase photon sieve
作者: Wenbo Jiang; Song Hua; Lixin Zhaoa; Wei Yana; Yong Yang
刊名: Optik
出版日期: 2010
卷号: 121, 页码:637-640
通讯作者: Wenbo Jiang
文章类型: 期刊论文
中文摘要: The imaging principle of Fresnel zone plate and photon sieve were analyzed in this paper. The design and fabrication of phase photon sieve were discussed. The feasibility of using phase photon sieve to realize nano-lithography was analyzed, a novel lithography experiment system based on phase photon sieve was presented, which not only has higher resolution and image contrast than the Fresnel zone plate lithography but also have higher diffractive efficiency than the amplitude photon sieve lithography.
英文摘要: The imaging principle of Fresnel zone plate and photon sieve were analyzed in this paper. The design and fabrication of phase photon sieve were discussed. The feasibility of using phase photon sieve to realize nano-lithography was analyzed, a novel lithography experiment system based on phase photon sieve was presented, which not only has higher resolution and image contrast than the Fresnel zone plate lithography but also have higher diffractive efficiency than the amplitude photon sieve lithography.
语种: 英语
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7231
Appears in Collections:微电子装备总体研究室(四室)_期刊论文

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作者单位: 中国科学院光电技术研究所

Recommended Citation:
Wenbo Jiang,Song Hua,Lixin Zhaoa,et al. Design and application of phase photon sieve[J]. Optik,2010,121:637-640.
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