| Design and application of phase photon sieve | |
| Wenbo Jiang; Song Hua; Lixin Zhaoa; Wei Yana; Yong Yang | |
| Source Publication | Optik
 |
| Volume | 121Pages:637-640 |
| 2010 | |
| Language | 英语 |
| Subtype | 期刊论文 |
| Abstract | The imaging principle of Fresnel zone plate and photon sieve were analyzed in this paper. The design and fabrication of phase photon sieve were discussed. The feasibility of using phase photon sieve to realize nano-lithography was analyzed, a novel lithography experiment system based on phase photon sieve was presented, which not only has higher resolution and image contrast than the Fresnel zone plate lithography but also have higher diffractive efficiency than the amplitude photon sieve lithography.; The imaging principle of Fresnel zone plate and photon sieve were analyzed in this paper. The design and fabrication of phase photon sieve were discussed. The feasibility of using phase photon sieve to realize nano-lithography was analyzed, a novel lithography experiment system based on phase photon sieve was presented, which not only has higher resolution and image contrast than the Fresnel zone plate lithography but also have higher diffractive efficiency than the amplitude photon sieve lithography. |
| Document Type | 期刊论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/7231 |
| Collection | 微电子装备总体研究室（四室） |
| Corresponding Author | Wenbo Jiang |
| Affiliation | 中国科学院光电技术研究所 |
| Recommended Citation GB/T 7714 | Wenbo Jiang,Song Hua,Lixin Zhaoa,et al. Design and application of phase photon sieve[J]. Optik,2010,121:637-640. |
| APA | Wenbo Jiang,Song Hua,Lixin Zhaoa,Wei Yana,&Yong Yang.(2010).Design and application of phase photon sieve.Optik,121,637-640. |
| MLA | Wenbo Jiang,et al."Design and application of phase photon sieve".Optik 121(2010):637-640. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2010-228.pdf（275KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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