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Design and application of phase photon sieve
Wenbo Jiang; Song Hua; Lixin Zhaoa; Wei Yana; Yong Yang
Source PublicationOptik
Volume121Pages:637-640
2010
Language英语
Subtype期刊论文
AbstractThe imaging principle of Fresnel zone plate and photon sieve were analyzed in this paper. The design and fabrication of phase photon sieve were discussed. The feasibility of using phase photon sieve to realize nano-lithography was analyzed, a novel lithography experiment system based on phase photon sieve was presented, which not only has higher resolution and image contrast than the Fresnel zone plate lithography but also have higher diffractive efficiency than the amplitude photon sieve lithography.; The imaging principle of Fresnel zone plate and photon sieve were analyzed in this paper. The design and fabrication of phase photon sieve were discussed. The feasibility of using phase photon sieve to realize nano-lithography was analyzed, a novel lithography experiment system based on phase photon sieve was presented, which not only has higher resolution and image contrast than the Fresnel zone plate lithography but also have higher diffractive efficiency than the amplitude photon sieve lithography.
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7231
Collection微电子装备总体研究室(四室)
Corresponding AuthorWenbo Jiang
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
Wenbo Jiang,Song Hua,Lixin Zhaoa,et al. Design and application of phase photon sieve[J]. Optik,2010,121:637-640.
APA Wenbo Jiang,Song Hua,Lixin Zhaoa,Wei Yana,&Yong Yang.(2010).Design and application of phase photon sieve.Optik,121,637-640.
MLA Wenbo Jiang,et al."Design and application of phase photon sieve".Optik 121(2010):637-640.
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