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数字灰度投影光刻技术
赵立新; 严伟; 王建; 胡松; 唐小萍; 王肇志; 王淑蓉; 张正荣; 张雨东
Source Publication微纳电子技术
Volume46Issue:3Pages:181-185
2009
Language中文
Subtype期刊论文
Abstract随着MEMS和MOEMS技术的发展和器件制作对低成本、灵活、高效的需求,数字灰度无掩模光刻技术已成为人们研究的热点.介绍了一种基于数字微镜器件(DMD)的无掩模数字灰度投影光刻技术,结合电寻址数字微镜阵列的工作方式,分析了
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7228
Collection微电子装备总体研究室(四室)
Corresponding Author赵立新
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
赵立新,严伟,王建,等. 数字灰度投影光刻技术[J]. 微纳电子技术,2009,46(3):181-185.
APA 赵立新.,严伟.,王建.,胡松.,唐小萍.,...&张雨东.(2009).数字灰度投影光刻技术.微纳电子技术,46(3),181-185.
MLA 赵立新,et al."数字灰度投影光刻技术".微纳电子技术 46.3(2009):181-185.
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