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电子束曝光系统中精密工件台的测量系统
严伟; 胡松; 杨勇; 周绍林; 蒋文波; 李艳丽; 乔俊仙
Source Publication微纳电子技术
Volume46Issue:4Pages:244-249
2009
Language中文
Subtype期刊论文
Abstract介绍了电子束曝光技术的原理.根据精密工件台对测量系统的需要,设计了三轴工件台测量系统布局方式,并简单介绍了激光干涉测量系统所需元器件数量的计算方法.重点讨论了双频激光干涉测量原理、双频光束与运动方向敏感性的
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7226
Collection微电子装备总体研究室(四室)
Corresponding Author严伟
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
严伟,胡松,杨勇,等. 电子束曝光系统中精密工件台的测量系统[J]. 微纳电子技术,2009,46(4):244-249.
APA 严伟.,胡松.,杨勇.,周绍林.,蒋文波.,...&乔俊仙.(2009).电子束曝光系统中精密工件台的测量系统.微纳电子技术,46(4),244-249.
MLA 严伟,et al."电子束曝光系统中精密工件台的测量系统".微纳电子技术 46.4(2009):244-249.
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