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Fabrication of nanoscale line width using the improved optical maskless lithographic system
Jiang Wenbo; Hu Song; Zhao Lixin; Yan WEi; Yang Yong; Zhou Shaolin; Chen Wangfu
Source PublicationJournal of Computational and Theoretical Nanoscience
Volume6Issue:5Pages:1170-1174
2009
Language英语
Indexed BySCI ; Ei
Subtype期刊论文
AbstractIn this paper, we present a novel optical maskless lithographic system. Compared with conventional optical maskless lithographic system, there are three key techniques in our system. They are illuminating system, focusing system, precise position work-stage system. We introduce and analyze three systems in this paper respectively. Through theoretic analysis and optical lithographic experiment, the results show that it provides a direction of optical lithographic technology with higher resolution and lower cost. By proper design the structure of the whole system and melioration on diffractive element, better resolution can be realized. It will be used to fabricate the nanoscale line width in the near future after further meliorations.; In this paper, we present a novel optical maskless lithographic system. Compared with conventional optical maskless lithographic system, there are three key techniques in our system. They are illuminating system, focusing system, precise position work-stage system. We introduce and analyze three systems in this paper respectively. Through theoretic analysis and optical lithographic experiment, the results show that it provides a direction of optical lithographic technology with higher resolution and lower cost. By proper design the structure of the whole system and melioration on diffractive element, better resolution can be realized. It will be used to fabricate the nanoscale line width in the near future after further meliorations.
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/7221
Collection微电子装备总体研究室(四室)
Corresponding AuthorJiang Wenbo
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
Jiang Wenbo,Hu Song,Zhao Lixin,et al. Fabrication of nanoscale line width using the improved optical maskless lithographic system[J]. Journal of Computational and Theoretical Nanoscience,2009,6(5):1170-1174.
APA Jiang Wenbo.,Hu Song.,Zhao Lixin.,Yan WEi.,Yang Yong.,...&Chen Wangfu.(2009).Fabrication of nanoscale line width using the improved optical maskless lithographic system.Journal of Computational and Theoretical Nanoscience,6(5),1170-1174.
MLA Jiang Wenbo,et al."Fabrication of nanoscale line width using the improved optical maskless lithographic system".Journal of Computational and Theoretical Nanoscience 6.5(2009):1170-1174.
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