中国科学院光电技术研究所机构知识库
Advanced  
IOE OpenIR  > 微电子装备总体研究室(四室)  > 期刊论文
题名:
Fabrication of nanoscale line width using the improved optical maskless lithographic system
作者: Jiang Wenbo; Hu Song; Zhao Lixin; Yan WEi; Yang Yong; Zhou Shaolin; Chen Wangfu
刊名: Journal of Computational and Theoretical Nanoscience
出版日期: 2009
卷号: 6, 期号:5, 页码:1170-1174
通讯作者: Jiang Wenbo
文章类型: 期刊论文
中文摘要: In this paper, we present a novel optical maskless lithographic system. Compared with conventional optical maskless lithographic system, there are three key techniques in our system. They are illuminating system, focusing system, precise position work-stage system. We introduce and analyze three systems in this paper respectively. Through theoretic analysis and optical lithographic experiment, the results show that it provides a direction of optical lithographic technology with higher resolution and lower cost. By proper design the structure of the whole system and melioration on diffractive element, better resolution can be realized. It will be used to fabricate the nanoscale line width in the near future after further meliorations.
英文摘要: In this paper, we present a novel optical maskless lithographic system. Compared with conventional optical maskless lithographic system, there are three key techniques in our system. They are illuminating system, focusing system, precise position work-stage system. We introduce and analyze three systems in this paper respectively. Through theoretic analysis and optical lithographic experiment, the results show that it provides a direction of optical lithographic technology with higher resolution and lower cost. By proper design the structure of the whole system and melioration on diffractive element, better resolution can be realized. It will be used to fabricate the nanoscale line width in the near future after further meliorations.
收录类别: SCI ; Ei
语种: 英语
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/7221
Appears in Collections:微电子装备总体研究室(四室)_期刊论文

Files in This Item:
File Name/ File Size Content Type Version Access License
2009-219.pdf(417KB)期刊论文作者接受稿开放获取View 联系获取全文

作者单位: 中国科学院光电技术研究所

Recommended Citation:
Jiang Wenbo,Hu Song,Zhao Lixin,et al. Fabrication of nanoscale line width using the improved optical maskless lithographic system[J]. Journal of Computational and Theoretical Nanoscience,2009,6(5):1170-1174.
Service
Recommend this item
Sava as my favorate item
Show this item's statistics
Export Endnote File
Google Scholar
Similar articles in Google Scholar
[Jiang Wenbo]'s Articles
[Hu Song]'s Articles
[Zhao Lixin]'s Articles
CSDL cross search
Similar articles in CSDL Cross Search
[Jiang Wenbo]‘s Articles
[Hu Song]‘s Articles
[Zhao Lixin]‘s Articles
Related Copyright Policies
Null
Social Bookmarking
Add to CiteULike Add to Connotea Add to Del.icio.us Add to Digg Add to Reddit
文件名: 2009-219.pdf
格式: Adobe PDF
所有评论 (0)
暂无评论
 
评注功能仅针对注册用户开放,请您登录
您对该条目有什么异议,请填写以下表单,管理员会尽快联系您。
内 容:
Email:  *
单位:
验证码:   刷新
您在IR的使用过程中有什么好的想法或者建议可以反馈给我们。
标 题:
 *
内 容:
Email:  *
验证码:   刷新

Items in IR are protected by copyright, with all rights reserved, unless otherwise indicated.

 

 

Valid XHTML 1.0!
Copyright © 2007-2016  中国科学院光电技术研究所 - Feedback
Powered by CSpace