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射流抛光误差分析与材料去除稳定性研究
施春燕; 袁家虎; 伍凡; 万勇建
Source Publication光学学报
Volume31Issue:1Pages:170-174
2011
Language中文
Subtype期刊论文
Abstract研究了射流抛光材料去除面形不呈理想的对称形和重复抛光材料去除量的波动不稳性,分析认为射流抛光过程稳定性和误差因素会影响材料去除的不稳定性。分析了射流系统的误差影响因素,其主要由压力波动、磨粒沉降作用和流体的紊动作用等部分组成,并研究了各误差影响因素的产生机理和对材料去除的影响。通过仿真和实验分析,得到压力波动、磨粒沉降作用和流体紊动作用的波动范围,构建了基于各误差的材料去除稳定性的完整表达式,理论计算误差范围与实验误差范围吻合。
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/6992
Collection先光中心
Corresponding Author施春燕
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
施春燕,袁家虎,伍凡,等. 射流抛光误差分析与材料去除稳定性研究[J]. 光学学报,2011,31(1):170-174.
APA 施春燕,袁家虎,伍凡,&万勇建.(2011).射流抛光误差分析与材料去除稳定性研究.光学学报,31(1),170-174.
MLA 施春燕,et al."射流抛光误差分析与材料去除稳定性研究".光学学报 31.1(2011):170-174.
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