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基于MHD的磁射流抛光中流场的分析与模拟
施春燕; 伍凡; 袁家虎; 万勇建
Source Publication光学技术
Volume35Issue:5Pages:736-738+741
2009
Language中文
Subtype期刊论文
Abstract从理论上分析了磁射流抛光中的磁场与流场的相互作用,构建了磁射流抛光的冲击射流模型,基于磁流体动力学对磁射流抛光过程的紊动冲击射流进行数值模拟,得到了磁射流抛光过程的连续流场和射流在工件壁面上的压力、速度、紊
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/6960
Collection先光中心
Corresponding Author施春燕
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
施春燕,伍凡,袁家虎,等. 基于MHD的磁射流抛光中流场的分析与模拟[J]. 光学技术,2009,35(5):736-738+741.
APA 施春燕,伍凡,袁家虎,&万勇建.(2009).基于MHD的磁射流抛光中流场的分析与模拟.光学技术,35(5),736-738+741.
MLA 施春燕,et al."基于MHD的磁射流抛光中流场的分析与模拟".光学技术 35.5(2009):736-738+741.
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