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RB-SiC表面改性Si涂层的制备与性能
苑永涛; 刘红; 邵传兵; 陈益超; 方敬忠
Source Publication强激光与粒子束
Volume23Issue:5Pages:1281-1284
2011
Language中文
Subtype期刊论文
Abstract为了获得高质量光学表面的碳化硅反射镜,利用射频磁控溅射方法,在直径70 mm的RB-SiC基片上沉积了厚约100μm的Si改性涂层,对改性层进行超光滑加工,并对改性层的表面形貌及性能进行了测试。ZYGO表面粗糙度仪测试结果表明,抛光后Si改性涂层表面粗糙度均方根值达到了0.496 nm;X射线衍射仪测试显示,制备Si改性涂层为多晶结构;使用拉力机做附着力测试,结果表明膜基附着力大于10.7 MPa。证明采用磁控溅射技术制备的Si改性涂层均匀、致密、附着力好,能够满足RB-SiC材料表面改性要求。
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/6926
Collection轻量化中心
Corresponding Author苑永涛
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
苑永涛,刘红,邵传兵,等. RB-SiC表面改性Si涂层的制备与性能[J]. 强激光与粒子束,2011,23(5):1281-1284.
APA 苑永涛,刘红,邵传兵,陈益超,&方敬忠.(2011).RB-SiC表面改性Si涂层的制备与性能.强激光与粒子束,23(5),1281-1284.
MLA 苑永涛,et al."RB-SiC表面改性Si涂层的制备与性能".强激光与粒子束 23.5(2011):1281-1284.
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