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Wafer focusing measurement of optical lithography system based on Hartmann-Shack wavefront testing
Zhu, Xianchang; Hu, Song; Zhao, Lixin; Zhu, XC (reprint author), Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Sichuan, Peoples R China.
Source PublicationOPTICS AND LASERS IN ENGINEERING
Volume66Pages:128-131
2015
Language英语
ISSN0143-8166
DOI10.1016/j.optlaseng.2014.09.001
Indexed BySCI
WOS IDWOS:000347020700017
Subtype期刊论文
AbstractTo improve the focusing measurement precision of wafer in optical lithography instrument (OLI), a method based on Hartmann-Shack (HS) testing principle is introduced. Defocus of wafer is immediately detected by measuring the image change between plane and spherical wavefront. As defocus is measured by every sub-lens of microlens array (MLA), serials of defocus position are calculated at single shot of CCD sensor. Choose the average in this measurement the outstanding advantage of this technology is the high accuracy and efficiency. With an experiment to validate the feasibility, the accuracy of focusing measurement is indicated as 20 nm. (C) 2014 Elsevier Ltd. All rights reserved.; To improve the focusing measurement precision of wafer in optical lithography instrument (OLI), a method based on Hartmann-Shack (HS) testing principle is introduced. Defocus of wafer is immediately detected by measuring the image change between plane and spherical wavefront. As defocus is measured by every sub-lens of microlens array (MLA), serials of defocus position are calculated at single shot of CCD sensor. Choose the average in this measurement the outstanding advantage of this technology is the high accuracy and efficiency. With an experiment to validate the feasibility, the accuracy of focusing measurement is indicated as 20 nm. (C) 2014 Elsevier Ltd. All rights reserved.
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Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/6900
Collection微细加工光学技术国家重点实验室(开放室)
Corresponding AuthorZhu, XC (reprint author), Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Sichuan, Peoples R China.
Affiliation1.[Zhu, Xianchang
2.Hu, Song
3.Zhao, Lixin] Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Sichuan, Peoples R China
Recommended Citation
GB/T 7714
Zhu, Xianchang,Hu, Song,Zhao, Lixin,et al. Wafer focusing measurement of optical lithography system based on Hartmann-Shack wavefront testing[J]. OPTICS AND LASERS IN ENGINEERING,2015,66:128-131.
APA Zhu, Xianchang,Hu, Song,Zhao, Lixin,&Zhu, XC .(2015).Wafer focusing measurement of optical lithography system based on Hartmann-Shack wavefront testing.OPTICS AND LASERS IN ENGINEERING,66,128-131.
MLA Zhu, Xianchang,et al."Wafer focusing measurement of optical lithography system based on Hartmann-Shack wavefront testing".OPTICS AND LASERS IN ENGINEERING 66(2015):128-131.
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