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题名:
Wafer focusing measurement of optical lithography system based on Hartmann-Shack wavefront testing
作者: Zhu, Xianchang; Hu, Song; Zhao, Lixin
刊名: OPTICS AND LASERS IN ENGINEERING
出版日期: 2015
卷号: 66, 页码:128-131
学科分类: Focusing; Microlens array; Lithography
DOI: 10.1016/j.optlaseng.2014.09.001
通讯作者: Zhu, XC (reprint author), Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Sichuan, Peoples R China.
文章类型: 期刊论文
中文摘要: To improve the focusing measurement precision of wafer in optical lithography instrument (OLI), a method based on Hartmann-Shack (HS) testing principle is introduced. Defocus of wafer is immediately detected by measuring the image change between plane and spherical wavefront. As defocus is measured by every sub-lens of microlens array (MLA), serials of defocus position are calculated at single shot of CCD sensor. Choose the average in this measurement the outstanding advantage of this technology is the high accuracy and efficiency. With an experiment to validate the feasibility, the accuracy of focusing measurement is indicated as 20 nm. (C) 2014 Elsevier Ltd. All rights reserved.
英文摘要: To improve the focusing measurement precision of wafer in optical lithography instrument (OLI), a method based on Hartmann-Shack (HS) testing principle is introduced. Defocus of wafer is immediately detected by measuring the image change between plane and spherical wavefront. As defocus is measured by every sub-lens of microlens array (MLA), serials of defocus position are calculated at single shot of CCD sensor. Choose the average in this measurement the outstanding advantage of this technology is the high accuracy and efficiency. With an experiment to validate the feasibility, the accuracy of focusing measurement is indicated as 20 nm. (C) 2014 Elsevier Ltd. All rights reserved.
收录类别: SCI
语种: 英语
WOS记录号: WOS:000347020700017
ISSN号: 0143-8166
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/6900
Appears in Collections:微细加工光学技术国家重点实验室(开放室)_期刊论文

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作者单位: 1.[Zhu, Xianchang
2.Hu, Song
3.Zhao, Lixin] Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Sichuan, Peoples R China

Recommended Citation:
Zhu, Xianchang,Hu, Song,Zhao, Lixin. Wafer focusing measurement of optical lithography system based on Hartmann-Shack wavefront testing[J]. OPTICS AND LASERS IN ENGINEERING,2015,66:128-131.
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