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题名:
Going far beyond the near-field diffraction limit via plasmonic cavity lens with high spatial frequency spectrum off-axis illumination
作者: Zhao, Zeyu; Luo, Yunfei; Zhang, Wei; Wang, Changtao; Gao, Ping; Wang, Yanqin; Pu, Mingbo; Yao, Na; Zhao, Chengwei; Luo, Xiangang
刊名: SCIENTIFIC REPORTS
出版日期: 2015
卷号: 5, 页码:15320
学科分类: SCANNING INTERFEROMETER; THICKNESS MEASUREMENT; SILVER SUPERLENS; LITHOGRAPHY; RESOLUTION; PHOTOLITHOGRAPHY; EVANESCENT; LIGHT; FILM; NANOLITHOGRAPHY
DOI: 10.1038/srep15320
文章类型: 期刊论文
中文摘要: For near-field imaging optics, minimum resolvable feature size is highly constrained by the near-field diffraction limit associated with the illumination light wavelength and the air distance between the imaging devices and objects. In this study, a plasmonic cavity lens composed of Ag-photoresist-Ag form incorporating high spatial frequency spectrum off-axis illumination (OAI) is proposed to realize deep subwavelength imaging far beyond the near-field diffraction limit. This approach benefits from the resonance effect of the plasmonic cavity lens and the wavevector shifting behavior via OAI, which remarkably enhances the object's subwavelength information and damps negative imaging contribution from the longitudinal electric field component in imaging region. Experimental images of well resolved 60-nm half-pitch patterns under 365-nm ultra-violet light are demonstrated at air distance of 80 nm between the mask patterns and plasmonic cavity lens, approximately four-fold longer than that in the conventional near-field lithography and superlens scheme. The ultimate air distance for the 60-nm half-pitch object could be theoretically extended to 120 nm. Moreover, two-dimensional L-shape patterns and deep subwavelength patterns are illustrated via simulations and experiments. This study promises the significant potential to make plasmonic lithography as a practical, cost-effective, simple and parallel nano-fabrication approach.
英文摘要: For near-field imaging optics, minimum resolvable feature size is highly constrained by the near-field diffraction limit associated with the illumination light wavelength and the air distance between the imaging devices and objects. In this study, a plasmonic cavity lens composed of Ag-photoresist-Ag form incorporating high spatial frequency spectrum off-axis illumination (OAI) is proposed to realize deep subwavelength imaging far beyond the near-field diffraction limit. This approach benefits from the resonance effect of the plasmonic cavity lens and the wavevector shifting behavior via OAI, which remarkably enhances the object's subwavelength information and damps negative imaging contribution from the longitudinal electric field component in imaging region. Experimental images of well resolved 60-nm half-pitch patterns under 365-nm ultra-violet light are demonstrated at air distance of 80 nm between the mask patterns and plasmonic cavity lens, approximately four-fold longer than that in the conventional near-field lithography and superlens scheme. The ultimate air distance for the 60-nm half-pitch object could be theoretically extended to 120 nm. Moreover, two-dimensional L-shape patterns and deep subwavelength patterns are illustrated via simulations and experiments. This study promises the significant potential to make plasmonic lithography as a practical, cost-effective, simple and parallel nano-fabrication approach.
收录类别: SCI
项目资助者: 973 Program of China [2013CBA01700] ; National Natural Science Funds [61138002, 61177013]
语种: 英语
WOS记录号: WOS:000362988400001
ISSN号: 2045-2322
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/6887
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Recommended Citation:
Zhao, Zeyu,Luo, Yunfei,Zhang, Wei,et al. Going far beyond the near-field diffraction limit via plasmonic cavity lens with high spatial frequency spectrum off-axis illumination[J]. SCIENTIFIC REPORTS,2015,5:15320.
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