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Forming Sub-32-nm High-Aspect Plasmonic Spot via Bowtie Aperture Combined with Metal-Insulator-Metal Scheme
Wang, Yaohui; Yao, Na; Zhang, Wei; He, Jiayu; Wang, Changtao; Wang, Yanqin; Zhao, Zeyu; Luo, Xiangang
Source PublicationPLASMONICS
Volume10Issue:6Pages:1607-1613
2015
Language英语
ISSN1557-1955
DOI10.1007/s11468-015-9966-6
Indexed BySCI
WOS IDWOS:000364966300046
Subtype期刊论文
AbstractWe theoretically utilize bowtie aperture combined with metal-insulator-metal (MIM) scheme to obtain sub-32-nm (lambda/12) high-aspect plasmonic spots. The improvement of the depth profile is attributed to the asymmetry electromagnetic mode excitation in MIM structure and the decaying compensation of the reflective Ag layer. A theoretical near-field exposure model has been used to evaluate the exposure depth in the photoresist. It is demonstrated that the exposure depth of the sub-32-nm plasmonic spot is more than 20 nm, which is about four times of the bowtie aperture without MIM scheme. The influences of the air gap tolerance and the ridge gap size of bowtie aperture are also discussed.; We theoretically utilize bowtie aperture combined with metal-insulator-metal (MIM) scheme to obtain sub-32-nm (lambda/12) high-aspect plasmonic spots. The improvement of the depth profile is attributed to the asymmetry electromagnetic mode excitation in MIM structure and the decaying compensation of the reflective Ag layer. A theoretical near-field exposure model has been used to evaluate the exposure depth in the photoresist. It is demonstrated that the exposure depth of the sub-32-nm plasmonic spot is more than 20 nm, which is about four times of the bowtie aperture without MIM scheme. The influences of the air gap tolerance and the ridge gap size of bowtie aperture are also discussed.
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/6882
Collection微细加工光学技术国家重点实验室(开放室)
Recommended Citation
GB/T 7714
Wang, Yaohui,Yao, Na,Zhang, Wei,et al. Forming Sub-32-nm High-Aspect Plasmonic Spot via Bowtie Aperture Combined with Metal-Insulator-Metal Scheme[J]. PLASMONICS,2015,10(6):1607-1613.
APA Wang, Yaohui.,Yao, Na.,Zhang, Wei.,He, Jiayu.,Wang, Changtao.,...&Luo, Xiangang.(2015).Forming Sub-32-nm High-Aspect Plasmonic Spot via Bowtie Aperture Combined with Metal-Insulator-Metal Scheme.PLASMONICS,10(6),1607-1613.
MLA Wang, Yaohui,et al."Forming Sub-32-nm High-Aspect Plasmonic Spot via Bowtie Aperture Combined with Metal-Insulator-Metal Scheme".PLASMONICS 10.6(2015):1607-1613.
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