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题名:
Forming Sub-32-nm High-Aspect Plasmonic Spot via Bowtie Aperture Combined with Metal-Insulator-Metal Scheme
作者: Wang, Yaohui; Yao, Na; Zhang, Wei; He, Jiayu; Wang, Changtao; Wang, Yanqin; Zhao, Zeyu; Luo, Xiangang
刊名: PLASMONICS
出版日期: 2015
卷号: 10, 期号:6, 页码:1607-1613
学科分类: OFF-AXIS ILLUMINATION; NEAR-FIELD; NANOLITHOGRAPHY; LITHOGRAPHY; ANTENNAS; LENS
DOI: 10.1007/s11468-015-9966-6
文章类型: 期刊论文
中文摘要: We theoretically utilize bowtie aperture combined with metal-insulator-metal (MIM) scheme to obtain sub-32-nm (lambda/12) high-aspect plasmonic spots. The improvement of the depth profile is attributed to the asymmetry electromagnetic mode excitation in MIM structure and the decaying compensation of the reflective Ag layer. A theoretical near-field exposure model has been used to evaluate the exposure depth in the photoresist. It is demonstrated that the exposure depth of the sub-32-nm plasmonic spot is more than 20 nm, which is about four times of the bowtie aperture without MIM scheme. The influences of the air gap tolerance and the ridge gap size of bowtie aperture are also discussed.
英文摘要: We theoretically utilize bowtie aperture combined with metal-insulator-metal (MIM) scheme to obtain sub-32-nm (lambda/12) high-aspect plasmonic spots. The improvement of the depth profile is attributed to the asymmetry electromagnetic mode excitation in MIM structure and the decaying compensation of the reflective Ag layer. A theoretical near-field exposure model has been used to evaluate the exposure depth in the photoresist. It is demonstrated that the exposure depth of the sub-32-nm plasmonic spot is more than 20 nm, which is about four times of the bowtie aperture without MIM scheme. The influences of the air gap tolerance and the ridge gap size of bowtie aperture are also discussed.
收录类别: SCI
项目资助者: 973 Program of China [2013CBA01700] ; National Natural Science Funds [61138002, 61177013]
语种: 英语
WOS记录号: WOS:000364966300046
ISSN号: 1557-1955
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/6882
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Recommended Citation:
Wang, Yaohui,Yao, Na,Zhang, Wei,et al. Forming Sub-32-nm High-Aspect Plasmonic Spot via Bowtie Aperture Combined with Metal-Insulator-Metal Scheme[J]. PLASMONICS,2015,10(6):1607-1613.
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