IOE OpenIR  > 微细加工光学技术国家重点实验室(开放室)
Influence of sphere-surface distance and exposure dose on resolution of sphere-lens-Array lithography
Liu, Xianchao1,2; Li, Xiong2; Li, Ling1; Chen, Weidong1; Luo, Xiangang2
Source PublicationOptics Express
Volume23Issue:23Pages:30136-30142
2015
Language英语
ISSN1094-4087
DOI10.1364/OE.23.030136
Indexed BySCI ; Ei
WOS IDWOS:000366611500080
Subtype期刊论文
AbstractSphere-surface distance and exposure dose effects on lithography resolution of microsphere lens array are studied. A transparent gap is introduced between photoresist film and polystyrene microspheres to adjust light distribution of photoresist surface. The pores size on the photoresist film varies when the gap thickness is changed. By optimization gap thickness and exposure dose, sub-100 nm surface patterning array is achieved for sphere of 2.06 μm diameter and optical wavelength λ of 400 nm theoretically and experimentally. Furthermore, when smaller polystyrene sphere (1.25 μm diameter) is chosen, spot width of 35 nm is realized by numerical calculation. This nano-fabrication method is simple, low-cost and high-efficiency, which can provide opportunities to make a variety of nano-devices, such as biosensors and nano-Antennas. ©2015 Optical Society of America.; Sphere-surface distance and exposure dose effects on lithography resolution of microsphere lens array are studied. A transparent gap is introduced between photoresist film and polystyrene microspheres to adjust light distribution of photoresist surface. The pores size on the photoresist film varies when the gap thickness is changed. By optimization gap thickness and exposure dose, sub-100 nm surface patterning array is achieved for sphere of 2.06 μm diameter and optical wavelength λ of 400 nm theoretically and experimentally. Furthermore, when smaller polystyrene sphere (1.25 μm diameter) is chosen, spot width of 35 nm is realized by numerical calculation. This nano-fabrication method is simple, low-cost and high-efficiency, which can provide opportunities to make a variety of nano-devices, such as biosensors and nano-Antennas. ©2015 Optical Society of America.
Citation statistics
Cited Times:7[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/6880
Collection微细加工光学技术国家重点实验室(开放室)
Affiliation1. Institute of Solid State Physics and Department of Physics, Sichuan Normal University, Chengdu, China
2. State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu, China
Recommended Citation
GB/T 7714
Liu, Xianchao,Li, Xiong,Li, Ling,et al. Influence of sphere-surface distance and exposure dose on resolution of sphere-lens-Array lithography[J]. Optics Express,2015,23(23):30136-30142.
APA Liu, Xianchao,Li, Xiong,Li, Ling,Chen, Weidong,&Luo, Xiangang.(2015).Influence of sphere-surface distance and exposure dose on resolution of sphere-lens-Array lithography.Optics Express,23(23),30136-30142.
MLA Liu, Xianchao,et al."Influence of sphere-surface distance and exposure dose on resolution of sphere-lens-Array lithography".Optics Express 23.23(2015):30136-30142.
Files in This Item:
File Name/Size DocType Version Access License
2015-2122.pdf(2279KB)期刊论文作者接受稿开放获取CC BY-NC-SAView Application Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Liu, Xianchao]'s Articles
[Li, Xiong]'s Articles
[Li, Ling]'s Articles
Baidu academic
Similar articles in Baidu academic
[Liu, Xianchao]'s Articles
[Li, Xiong]'s Articles
[Li, Ling]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Liu, Xianchao]'s Articles
[Li, Xiong]'s Articles
[Li, Ling]'s Articles
Terms of Use
No data!
Social Bookmark/Share
File name: 2015-2122.pdf
Format: Adobe PDF
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.