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题名:
Influence of sphere-surface distance and exposure dose on resolution of sphere-lens-Array lithography
作者: Liu, Xianchao1,2; Li, Xiong2; Li, Ling1; Chen, Weidong1; Luo, Xiangang2
刊名: Optics Express
出版日期: 2015
卷号: 23, 期号:23, 页码:30136-30142
学科分类: Microspheres - Nanoantennas - Photoresists - Polystyrenes
DOI: 10.1364/OE.23.030136
文章类型: 期刊论文
中文摘要: Sphere-surface distance and exposure dose effects on lithography resolution of microsphere lens array are studied. A transparent gap is introduced between photoresist film and polystyrene microspheres to adjust light distribution of photoresist surface. The pores size on the photoresist film varies when the gap thickness is changed. By optimization gap thickness and exposure dose, sub-100 nm surface patterning array is achieved for sphere of 2.06 μm diameter and optical wavelength λ of 400 nm theoretically and experimentally. Furthermore, when smaller polystyrene sphere (1.25 μm diameter) is chosen, spot width of 35 nm is realized by numerical calculation. This nano-fabrication method is simple, low-cost and high-efficiency, which can provide opportunities to make a variety of nano-devices, such as biosensors and nano-Antennas. ©2015 Optical Society of America.
英文摘要: Sphere-surface distance and exposure dose effects on lithography resolution of microsphere lens array are studied. A transparent gap is introduced between photoresist film and polystyrene microspheres to adjust light distribution of photoresist surface. The pores size on the photoresist film varies when the gap thickness is changed. By optimization gap thickness and exposure dose, sub-100 nm surface patterning array is achieved for sphere of 2.06 μm diameter and optical wavelength λ of 400 nm theoretically and experimentally. Furthermore, when smaller polystyrene sphere (1.25 μm diameter) is chosen, spot width of 35 nm is realized by numerical calculation. This nano-fabrication method is simple, low-cost and high-efficiency, which can provide opportunities to make a variety of nano-devices, such as biosensors and nano-Antennas. ©2015 Optical Society of America.
收录类别: SCI ; Ei
项目资助者: 973 Program of China [2013CBA01700] ; National Natural Science Foundation of China [61138002, 61307043]
语种: 英语
WOS记录号: WOS:000366611500080
ISSN号: 1094-4087
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/6880
Appears in Collections:微细加工光学技术国家重点实验室(开放室)_期刊论文

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作者单位: 1. Institute of Solid State Physics and Department of Physics, Sichuan Normal University, Chengdu, China
2. State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu, China

Recommended Citation:
Liu, Xianchao,Li, Xiong,Li, Ling,et al. Influence of sphere-surface distance and exposure dose on resolution of sphere-lens-Array lithography[J]. Optics Express,2015,23(23):30136-30142.
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