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题名:
Fabrication of anisotropically arrayed nano-slots metasurfaces using reflective plasmonic lithography
作者: Luo, Jun; Zeng, Bo; Wang, Changtao; Gao, Ping; Liu, Kaipeng; Pu, Mingbo; Jin, Jinjin; Zhao, Zeyu; Li, Xiong; Yu, Honglin; Luo, Xiangang
刊名: NANOSCALE
出版日期: 2015
卷号: 7, 期号:44, 页码:18805-18812
学科分类: EVANESCENT NEAR-FIELD; OPTICAL LITHOGRAPHY; SILVER SUPERLENS; VISIBLE-LIGHT; REFRACTION; SURFACE; POLARITONS
DOI: 10.1039/c5nr05153c
文章类型: 期刊论文
中文摘要: Nanofabrication technology with high-resolution, high-throughput and low-cost is essential for the development of nanoplasmonic and nanophotonic devices. At present, most metasurfaces are fabricated in a point by point writing manner with electron beam lithography or a focused ion beam, which imposes a serious cost barrier with respect to practical applications. Near field optical lithography, seemingly providing a high-resolution and low-cost way, however, suffers from the ultra shallow depth and poor fidelity of obtained photoresist patterns due to the exponential decay feature of evanescent waves. Here, we propose a method of surface plasmonic imaging lithography by introducing a reflective plasmonic lens to amplify and compensate evanescent waves, resulting in the production of nano resist patterns with high fidelity, contrast and enhanced depth beyond that usually obtained by near field optical lithography. As examples, a discrete and anisotropically arrayed nano-slots mask pattern with different orientations and a size of 40 nm x 120 nm could be imaged in photoresist and transferred successfully onto a metal layer through an etching process. Evidence for the pattern quality is given by virtue of the fabricated meta-surface lens devices showing good focusing performance in experiments. It is believed that this method provides a parallel, low-cost, high-throughput and large-area nanofabrication route for fabricating nano-structures of holograms, vortex phase plates, bio-sensors and solar cells etc.
英文摘要: Nanofabrication technology with high-resolution, high-throughput and low-cost is essential for the development of nanoplasmonic and nanophotonic devices. At present, most metasurfaces are fabricated in a point by point writing manner with electron beam lithography or a focused ion beam, which imposes a serious cost barrier with respect to practical applications. Near field optical lithography, seemingly providing a high-resolution and low-cost way, however, suffers from the ultra shallow depth and poor fidelity of obtained photoresist patterns due to the exponential decay feature of evanescent waves. Here, we propose a method of surface plasmonic imaging lithography by introducing a reflective plasmonic lens to amplify and compensate evanescent waves, resulting in the production of nano resist patterns with high fidelity, contrast and enhanced depth beyond that usually obtained by near field optical lithography. As examples, a discrete and anisotropically arrayed nano-slots mask pattern with different orientations and a size of 40 nm x 120 nm could be imaged in photoresist and transferred successfully onto a metal layer through an etching process. Evidence for the pattern quality is given by virtue of the fabricated meta-surface lens devices showing good focusing performance in experiments. It is believed that this method provides a parallel, low-cost, high-throughput and large-area nanofabrication route for fabricating nano-structures of holograms, vortex phase plates, bio-sensors and solar cells etc.
收录类别: SCI
项目资助者: 973 Program of China [2013CBA01700] ; National Natural Science Funds [61138002]
语种: 英语
WOS记录号: WOS:000364824000050
ISSN号: 2040-3364
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/6878
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Recommended Citation:
Luo, Jun,Zeng, Bo,Wang, Changtao,et al. Fabrication of anisotropically arrayed nano-slots metasurfaces using reflective plasmonic lithography[J]. NANOSCALE,2015,7(44):18805-18812.
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