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Squeezing Bulk Plasmon Polaritons through Hyperbolic Metamaterials for Large Area Deep Subwavelength Interference Lithography
Liang, Gaofeng1,2; Wang, Changtao1; Zhao, Zeyu1; Wang, Yanqin1; Yao, Na1; Gao, Ping1; Luo, Yunfei1; Gao, Guohan1; Zhao, Qing2; Luo, Xiangang1
Source PublicationAdvanced Optical Materials
Volume3Issue:9Pages:1248-1256
2015
Language英语
ISSN2195-1071
DOI10.1002/adom.201400596
Indexed BySCI ; EI
WOS IDWOS:000362524300014
Subtype期刊论文
Abstract

Hyperbolic metamaterial composed of SiO2/Al films are explored to squeeze out bulk plasmon polaritons (BPPs) to produce large area and uniform deep subwavelength interference patterns. As examples, two and four BPPs interference lithography with half pitch 45 nm (≈λ/8) are demonstrated in experiments. Much deeper resolution up to 22.5 nm (≈λ/16) and variety of BPPs interference patterns are feasible. The period of grating structures for transferring photons to BPPs is much larger than that of BPPs interference patterns, facilitating the structures fabrication by simple and low cost methods like large area laser interference lithography. It is believed that the method provides a cost-effective, parallel, and large area nanofabrication way. Hyperbolic metamaterials composed of metal-dielectric films are explored to squeeze out bulk plasmon polaritons (BPPs) and produce large area, uniform, deep subwavelength interference patterns with half pitch 45 nm (≈λ/8). The method employs BPP excitation gratings with large feature sizes, which could be fabricated by conventional laser interference lithography, promising a way for cost-effective, parallel, and large area nanofabrication. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.;Hyperbolic metamaterial composed of SiO2/Al films are explored to squeeze out bulk plasmon polaritons (BPPs) to produce large area and uniform deep subwavelength interference patterns. As examples, two and four BPPs interference lithography with half pitch 45 nm (≈λ/8) are demonstrated in experiments. Much deeper resolution up to 22.5 nm (≈λ/16) and variety of BPPs interference patterns are feasible. The period of grating structures for transferring photons to BPPs is much larger than that of BPPs interference patterns, facilitating the structures fabrication by simple and low cost methods like large area laser interference lithography. It is believed that the method provides a cost-effective, parallel, and large area nanofabrication way. Hyperbolic metamaterials composed of metal-dielectric films are explored to squeeze out bulk plasmon polaritons (BPPs) and produce large area, uniform, deep subwavelength interference patterns with half pitch 45 nm (≈λ/8). The method employs BPP excitation gratings with large feature sizes, which could be fabricated by conventional laser interference lithography, promising a way for cost-effective, parallel, and large area nanofabrication. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

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Cited Times:44[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/6874
Collection微细加工光学技术国家重点实验室(开放室)
Corresponding AuthorLuo, Xiangang
Affiliation1.State Key Lab of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics Chinese Academy of Sciences, P.O. Box 350, Chengdu, China
2.School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu, China
Recommended Citation
GB/T 7714
Liang, Gaofeng,Wang, Changtao,Zhao, Zeyu,et al. Squeezing Bulk Plasmon Polaritons through Hyperbolic Metamaterials for Large Area Deep Subwavelength Interference Lithography[J]. Advanced Optical Materials,2015,3(9):1248-1256.
APA Liang, Gaofeng.,Wang, Changtao.,Zhao, Zeyu.,Wang, Yanqin.,Yao, Na.,...&Luo, Xiangang.(2015).Squeezing Bulk Plasmon Polaritons through Hyperbolic Metamaterials for Large Area Deep Subwavelength Interference Lithography.Advanced Optical Materials,3(9),1248-1256.
MLA Liang, Gaofeng,et al."Squeezing Bulk Plasmon Polaritons through Hyperbolic Metamaterials for Large Area Deep Subwavelength Interference Lithography".Advanced Optical Materials 3.9(2015):1248-1256.
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