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题名:
Squeezing Bulk Plasmon Polaritons through Hyperbolic Metamaterials for Large Area Deep Subwavelength Interference Lithography
作者: Liang, Gaofeng1,2; Wang, Changtao1; Zhao, Zeyu1; Wang, Yanqin1; Yao, Na1; Gao, Ping1; Luo, Yunfei1; Gao, Guohan1; Zhao, Qing2; Luo, Xiangang1
刊名: Advanced Optical Materials
出版日期: 2015
卷号: 3, 期号:9, 页码:1248-1256
学科分类: Cost effectiveness - Costs - Dielectric films - Electron emission - Laser excitation - Lithography - Metamaterials - Nanotechnology - Phonons - Plasmons - Quantum theory
DOI: 10.1002/adom.201400596
通讯作者: Luo, Xiangang
文章类型: 期刊论文
中文摘要: Hyperbolic metamaterial composed of SiO2/Al films are explored to squeeze out bulk plasmon polaritons (BPPs) to produce large area and uniform deep subwavelength interference patterns. As examples, two and four BPPs interference lithography with half pitch 45 nm (≈λ/8) are demonstrated in experiments. Much deeper resolution up to 22.5 nm (≈λ/16) and variety of BPPs interference patterns are feasible. The period of grating structures for transferring photons to BPPs is much larger than that of BPPs interference patterns, facilitating the structures fabrication by simple and low cost methods like large area laser interference lithography. It is believed that the method provides a cost-effective, parallel, and large area nanofabrication way. Hyperbolic metamaterials composed of metal-dielectric films are explored to squeeze out bulk plasmon polaritons (BPPs) and produce large area, uniform, deep subwavelength interference patterns with half pitch 45 nm (≈λ/8). The method employs BPP excitation gratings with large feature sizes, which could be fabricated by conventional laser interference lithography, promising a way for cost-effective, parallel, and large area nanofabrication. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
英文摘要: Hyperbolic metamaterial composed of SiO2/Al films are explored to squeeze out bulk plasmon polaritons (BPPs) to produce large area and uniform deep subwavelength interference patterns. As examples, two and four BPPs interference lithography with half pitch 45 nm (≈λ/8) are demonstrated in experiments. Much deeper resolution up to 22.5 nm (≈λ/16) and variety of BPPs interference patterns are feasible. The period of grating structures for transferring photons to BPPs is much larger than that of BPPs interference patterns, facilitating the structures fabrication by simple and low cost methods like large area laser interference lithography. It is believed that the method provides a cost-effective, parallel, and large area nanofabrication way. Hyperbolic metamaterials composed of metal-dielectric films are explored to squeeze out bulk plasmon polaritons (BPPs) and produce large area, uniform, deep subwavelength interference patterns with half pitch 45 nm (≈λ/8). The method employs BPP excitation gratings with large feature sizes, which could be fabricated by conventional laser interference lithography, promising a way for cost-effective, parallel, and large area nanofabrication. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
收录类别: SCI ; Ei
项目资助者: 973 Program of China [2013CBA01700] ; Chinese Nature Science Grant [61138002, 61177013] ; Program of International Cooperation [2011DFA63190]
语种: 英语
WOS记录号: WOS:000362524300014
ISSN号: 2195-1071
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/6874
Appears in Collections:微细加工光学技术国家重点实验室(开放室)_期刊论文

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作者单位: 1. State Key Lab of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics Chinese Academy of Sciences, P.O. Box 350, Chengdu, China
2. School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu, China

Recommended Citation:
Liang, Gaofeng,Wang, Changtao,Zhao, Zeyu,et al. Squeezing Bulk Plasmon Polaritons through Hyperbolic Metamaterials for Large Area Deep Subwavelength Interference Lithography[J]. Advanced Optical Materials,2015,3(9):1248-1256.
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