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题名:
High resolution photolithography with sub-wavelength grating
作者: Zhao, Qing1; Liang, Gaofeng1,2; Wang, Changtao2; Huang, Xiaoping1; Chen, Zexiang3; Luo, Xiangang2
刊名: Applied Physics A: Materials Science and Processing: Near field optics
出版日期: 2014
卷号: 115, 期号:1, 页码:69-73
学科分类: Diffraction gratings - Near field scanning optical microscopy - Photoresists
DOI: 10.1007/s00339-013-8006-7
通讯作者: Zhao, Q. (zhaoq@uestc.edu.cn)
文章类型: 期刊论文
中文摘要: Based on the theory of surface plasmon resonance and the special nano-optical effect of metal/dielectric multilayer composites, we obtained a high-resolution image of a sub-wavelength grating. We discussed multilayer parameters on equal thickness, and achieved sufficient contrast and high intensity through numerical simulation based on the finite element method. By chosen the best scheme, an experimental of multilayer planar lens lithography has been carried out. The main point is the use of metal-dielectric composites to realize high-resolution image under 365-nm polarization light incidence. By controlling the experimental parameters accurately, a fidelity image is recorded on the photoresist. © 2013 Springer-Verlag Berlin Heidelberg.
英文摘要: Based on the theory of surface plasmon resonance and the special nano-optical effect of metal/dielectric multilayer composites, we obtained a high-resolution image of a sub-wavelength grating. We discussed multilayer parameters on equal thickness, and achieved sufficient contrast and high intensity through numerical simulation based on the finite element method. By chosen the best scheme, an experimental of multilayer planar lens lithography has been carried out. The main point is the use of metal-dielectric composites to realize high-resolution image under 365-nm polarization light incidence. By controlling the experimental parameters accurately, a fidelity image is recorded on the photoresist. © 2013 Springer-Verlag Berlin Heidelberg.
收录类别: SCI ; Ei
项目资助者: International Cooperation Projects [2011DFA63190] ; National Natural Science Foundation of China [11275045, 11274058, 11004024, 61071027]
语种: 英语
WOS记录号: WOS:000333612400012
ISSN号: 09478396
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/6866
Appears in Collections:微细加工光学技术国家重点实验室(开放室)_期刊论文

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作者单位: 1. School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054, China
2. State Key Lab of Optical Technologies on Nano-fabrication and Micro-engineering, Institute of Optical and Electronics, Chinese Academy of Science, Chengdu 610209, China
3. School of Optic-Electronic Information, University of Electronic Science and Technology of China, Chengdu 610054, China

Recommended Citation:
Zhao, Qing,Liang, Gaofeng,Wang, Changtao,et al. High resolution photolithography with sub-wavelength grating[J]. Applied Physics A: Materials Science and Processing: Near field optics,2014,115(1):69-73.
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