IOE OpenIR  > 微细加工光学技术国家重点实验室(开放室)
High resolution photolithography with sub-wavelength grating
Zhao, Qing1; Liang, Gaofeng1,2; Wang, Changtao2; Huang, Xiaoping1; Chen, Zexiang3; Luo, Xiangang2; Zhao, Q. (zhaoq@uestc.edu.cn)
Source PublicationApplied Physics A: Materials Science and Processing: Near field optics
Volume115Issue:1Pages:69-73
2014
Language英语
ISSN09478396
DOI10.1007/s00339-013-8006-7
Indexed BySCI ; Ei
WOS IDWOS:000333612400012
Subtype期刊论文
AbstractBased on the theory of surface plasmon resonance and the special nano-optical effect of metal/dielectric multilayer composites, we obtained a high-resolution image of a sub-wavelength grating. We discussed multilayer parameters on equal thickness, and achieved sufficient contrast and high intensity through numerical simulation based on the finite element method. By chosen the best scheme, an experimental of multilayer planar lens lithography has been carried out. The main point is the use of metal-dielectric composites to realize high-resolution image under 365-nm polarization light incidence. By controlling the experimental parameters accurately, a fidelity image is recorded on the photoresist. © 2013 Springer-Verlag Berlin Heidelberg.; Based on the theory of surface plasmon resonance and the special nano-optical effect of metal/dielectric multilayer composites, we obtained a high-resolution image of a sub-wavelength grating. We discussed multilayer parameters on equal thickness, and achieved sufficient contrast and high intensity through numerical simulation based on the finite element method. By chosen the best scheme, an experimental of multilayer planar lens lithography has been carried out. The main point is the use of metal-dielectric composites to realize high-resolution image under 365-nm polarization light incidence. By controlling the experimental parameters accurately, a fidelity image is recorded on the photoresist. © 2013 Springer-Verlag Berlin Heidelberg.
Citation statistics
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/6866
Collection微细加工光学技术国家重点实验室(开放室)
Corresponding AuthorZhao, Q. (zhaoq@uestc.edu.cn)
Affiliation1. School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054, China
2. State Key Lab of Optical Technologies on Nano-fabrication and Micro-engineering, Institute of Optical and Electronics, Chinese Academy of Science, Chengdu 610209, China
3. School of Optic-Electronic Information, University of Electronic Science and Technology of China, Chengdu 610054, China
Recommended Citation
GB/T 7714
Zhao, Qing,Liang, Gaofeng,Wang, Changtao,et al. High resolution photolithography with sub-wavelength grating[J]. Applied Physics A: Materials Science and Processing: Near field optics,2014,115(1):69-73.
APA Zhao, Qing.,Liang, Gaofeng.,Wang, Changtao.,Huang, Xiaoping.,Chen, Zexiang.,...&Zhao, Q. .(2014).High resolution photolithography with sub-wavelength grating.Applied Physics A: Materials Science and Processing: Near field optics,115(1),69-73.
MLA Zhao, Qing,et al."High resolution photolithography with sub-wavelength grating".Applied Physics A: Materials Science and Processing: Near field optics 115.1(2014):69-73.
Files in This Item:
File Name/Size DocType Version Access License
2014-2179.pdf(1149KB)期刊论文作者接受稿开放获取CC BY-NC-SAView Application Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Zhao, Qing]'s Articles
[Liang, Gaofeng]'s Articles
[Wang, Changtao]'s Articles
Baidu academic
Similar articles in Baidu academic
[Zhao, Qing]'s Articles
[Liang, Gaofeng]'s Articles
[Wang, Changtao]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Zhao, Qing]'s Articles
[Liang, Gaofeng]'s Articles
[Wang, Changtao]'s Articles
Terms of Use
No data!
Social Bookmark/Share
File name: 2014-2179.pdf
Format: Adobe PDF
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.