题名: Plane demagnifying nanolithography by hybrid hyperlens-superlens structure
作者: Liang, Gaofeng 1,2 ; Zhao, Zeyu 2 ; Yao, Na 2 ; Wang, Changtao 2 ; Jiang, Bo 3 ; Zhao, Qing 1 ; Luo, Xiangang 2
刊名: Journal of Nanophotonics
出版日期: 2014
卷号: 8, 期号: 1, 页码: 083080 学科分类: Computer simulation - Cylinders (shapes) - Masks - Multilayers - Nanophotonics - Photoresists
DOI: 10.1117/1.JNP.8.083080
通讯作者: Zhao, Q. (zhaoq@uestc.edu.cn)
文章类型: 期刊论文
中文摘要: We propose a hybrid hyperlens-superlens structure to achieve demagnifying nanolithography. It consists of a core of planar superlens and a shell of cylinder hyperlens. In the nanolithography process, the shell of the cylinder hyperlens could demagnify the mask patterns to the interior cylinder interface, and then the core of the planar superlens transmits the demagnified patterns to the planar output photoresist layer. The performance of this hybrid hyperlens-superlens structure is analyzed for different periods and spacing of mask and demagnification factors. The numerical simulation results agree well with the theory. It is demonstrated that the hybrid structure could be used as a superresolution device for plane demagnifying nanolithography. © 2014 Society of Photo-Optical Instrumentation Engineers. 英文摘要: We propose a hybrid hyperlens-superlens structure to achieve demagnifying nanolithography. It consists of a core of planar superlens and a shell of cylinder hyperlens. In the nanolithography process, the shell of the cylinder hyperlens could demagnify the mask patterns to the interior cylinder interface, and then the core of the planar superlens transmits the demagnified patterns to the planar output photoresist layer. The performance of this hybrid hyperlens-superlens structure is analyzed for different periods and spacing of mask and demagnification factors. The numerical simulation results agree well with the theory. It is demonstrated that the hybrid structure could be used as a superresolution device for plane demagnifying nanolithography. © 2014 Society of Photo-Optical Instrumentation Engineers. 收录类别: SCI
; Ei
语种: 英语
WOS记录号: WOS:000339160200001
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内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/6861
Appears in Collections: 微细加工光学技术国家重点实验室（开放室）_期刊论文
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作者单位: 1. University of Electronic Science and Technology of China, School of Physical Electronics, Chengdu 610054, China
Recommended Citation:
Liang, Gaofeng,Zhao, Zeyu,Yao, Na,et al. Plane demagnifying nanolithography by hybrid hyperlens-superlens structure[J]. Journal of Nanophotonics,2014,8(1):083080.
