| Plane demagnifying nanolithography by hybrid hyperlens-superlens structure | |
| Liang, Gaofeng1,2; Zhao, Zeyu2; Yao, Na2; Wang, Changtao2; Jiang, Bo3; Zhao, Qing1; Luo, Xiangang2; Zhao, Q. (zhaoq@uestc.edu.cn) | |
| Source Publication | Journal of Nanophotonics
 |
| Volume | 8Issue:1Pages:083080 |
| 2014 | |
| Language | 英语 |
| DOI | 10.1117/1.JNP.8.083080 |
| Indexed By | SCI ; Ei |
| WOS ID | WOS:000339160200001 |
| Subtype | 期刊论文 |
| Abstract | We propose a hybrid hyperlens-superlens structure to achieve demagnifying nanolithography. It consists of a core of planar superlens and a shell of cylinder hyperlens. In the nanolithography process, the shell of the cylinder hyperlens could demagnify the mask patterns to the interior cylinder interface, and then the core of the planar superlens transmits the demagnified patterns to the planar output photoresist layer. The performance of this hybrid hyperlens-superlens structure is analyzed for different periods and spacing of mask and demagnification factors. The numerical simulation results agree well with the theory. It is demonstrated that the hybrid structure could be used as a superresolution device for plane demagnifying nanolithography. © 2014 Society of Photo-Optical Instrumentation Engineers.; We propose a hybrid hyperlens-superlens structure to achieve demagnifying nanolithography. It consists of a core of planar superlens and a shell of cylinder hyperlens. In the nanolithography process, the shell of the cylinder hyperlens could demagnify the mask patterns to the interior cylinder interface, and then the core of the planar superlens transmits the demagnified patterns to the planar output photoresist layer. The performance of this hybrid hyperlens-superlens structure is analyzed for different periods and spacing of mask and demagnification factors. The numerical simulation results agree well with the theory. It is demonstrated that the hybrid structure could be used as a superresolution device for plane demagnifying nanolithography. © 2014 Society of Photo-Optical Instrumentation Engineers. |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/6861 |
| Collection | 微细加工光学技术国家重点实验室（开放室） |
| Corresponding Author | Zhao, Q. (zhaoq@uestc.edu.cn) |
| Affiliation | 1. University of Electronic Science and Technology of China, School of Physical Electronics, Chengdu 610054, China 2. Chinese Academy of Sciences, Institute of Optics and Electronics, State Key Lab of Optical Technologies on Nano-fabrication and Micro-engineering, Chengdu 610209, China 3. No. 33 Research Institute of China, Electronics Technology Group Corporation, Taiyuan 030006, China |
| Recommended Citation GB/T 7714 | Liang, Gaofeng,Zhao, Zeyu,Yao, Na,et al. Plane demagnifying nanolithography by hybrid hyperlens-superlens structure[J]. Journal of Nanophotonics,2014,8(1):083080. |
| APA | Liang, Gaofeng.,Zhao, Zeyu.,Yao, Na.,Wang, Changtao.,Jiang, Bo.,...&Zhao, Q. .(2014).Plane demagnifying nanolithography by hybrid hyperlens-superlens structure.Journal of Nanophotonics,8(1),083080. |
| MLA | Liang, Gaofeng,et al."Plane demagnifying nanolithography by hybrid hyperlens-superlens structure".Journal of Nanophotonics 8.1(2014):083080. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2014-2040.pdf（1222KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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