中国科学院光电技术研究所机构知识库
Advanced  
IOE OpenIR  > 微细加工光学技术国家重点实验室(开放室)  > 期刊论文
题名:
Plane demagnifying nanolithography by hybrid hyperlens-superlens structure
作者: Liang, Gaofeng1,2; Zhao, Zeyu2; Yao, Na2; Wang, Changtao2; Jiang, Bo3; Zhao, Qing1; Luo, Xiangang2
刊名: Journal of Nanophotonics
出版日期: 2014
卷号: 8, 期号:1, 页码:083080
学科分类: Computer simulation - Cylinders (shapes) - Masks - Multilayers - Nanophotonics - Photoresists
DOI: 10.1117/1.JNP.8.083080
通讯作者: Zhao, Q. (zhaoq@uestc.edu.cn)
文章类型: 期刊论文
中文摘要: We propose a hybrid hyperlens-superlens structure to achieve demagnifying nanolithography. It consists of a core of planar superlens and a shell of cylinder hyperlens. In the nanolithography process, the shell of the cylinder hyperlens could demagnify the mask patterns to the interior cylinder interface, and then the core of the planar superlens transmits the demagnified patterns to the planar output photoresist layer. The performance of this hybrid hyperlens-superlens structure is analyzed for different periods and spacing of mask and demagnification factors. The numerical simulation results agree well with the theory. It is demonstrated that the hybrid structure could be used as a superresolution device for plane demagnifying nanolithography. © 2014 Society of Photo-Optical Instrumentation Engineers.
英文摘要: We propose a hybrid hyperlens-superlens structure to achieve demagnifying nanolithography. It consists of a core of planar superlens and a shell of cylinder hyperlens. In the nanolithography process, the shell of the cylinder hyperlens could demagnify the mask patterns to the interior cylinder interface, and then the core of the planar superlens transmits the demagnified patterns to the planar output photoresist layer. The performance of this hybrid hyperlens-superlens structure is analyzed for different periods and spacing of mask and demagnification factors. The numerical simulation results agree well with the theory. It is demonstrated that the hybrid structure could be used as a superresolution device for plane demagnifying nanolithography. © 2014 Society of Photo-Optical Instrumentation Engineers.
收录类别: SCI ; Ei
语种: 英语
WOS记录号: WOS:000339160200001
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/6861
Appears in Collections:微细加工光学技术国家重点实验室(开放室)_期刊论文

Files in This Item:
File Name/ File Size Content Type Version Access License
2014-2040.pdf(1222KB)期刊论文作者接受稿开放获取View 联系获取全文

作者单位: 1. University of Electronic Science and Technology of China, School of Physical Electronics, Chengdu 610054, China
2. Chinese Academy of Sciences, Institute of Optics and Electronics, State Key Lab of Optical Technologies on Nano-fabrication and Micro-engineering, Chengdu 610209, China
3. No. 33 Research Institute of China, Electronics Technology Group Corporation, Taiyuan 030006, China

Recommended Citation:
Liang, Gaofeng,Zhao, Zeyu,Yao, Na,et al. Plane demagnifying nanolithography by hybrid hyperlens-superlens structure[J]. Journal of Nanophotonics,2014,8(1):083080.
Service
Recommend this item
Sava as my favorate item
Show this item's statistics
Export Endnote File
Google Scholar
Similar articles in Google Scholar
[Liang, Gaofeng]'s Articles
[Zhao, Zeyu]'s Articles
[Yao, Na]'s Articles
CSDL cross search
Similar articles in CSDL Cross Search
[Liang, Gaofeng]‘s Articles
[Zhao, Zeyu]‘s Articles
[Yao, Na]‘s Articles
Related Copyright Policies
Null
Social Bookmarking
Add to CiteULike Add to Connotea Add to Del.icio.us Add to Digg Add to Reddit
文件名: 2014-2040.pdf
格式: Adobe PDF
所有评论 (0)
暂无评论
 
评注功能仅针对注册用户开放,请您登录
您对该条目有什么异议,请填写以下表单,管理员会尽快联系您。
内 容:
Email:  *
单位:
验证码:   刷新
您在IR的使用过程中有什么好的想法或者建议可以反馈给我们。
标 题:
 *
内 容:
Email:  *
验证码:   刷新

Items in IR are protected by copyright, with all rights reserved, unless otherwise indicated.

 

 

Valid XHTML 1.0!
Copyright © 2007-2016  中国科学院光电技术研究所 - Feedback
Powered by CSpace