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Design and fabrication of broadband ultralow reflectivity black Si surfaces by laser micro/nanoprocessing
Yang, Jing; Luo, Fangfang; Kao, Tsung Sheng; Li, Xiong; Ho, Ghim Wei; Teng, Jinghua; Luo, Xiangang; Hong, Minghui; Hong, MH (reprint author), Natl Univ Singapore, Dept Elect & Comp Engn, 4 Engn Dr 3, Singapore 117576, Singapore.
Source PublicationLIGHT-SCIENCE & APPLICATIONS
Volume3
2014
Language英语
ISSN2047-7538
DOI10.1038/lsa.2014.66
Indexed BySCI
WOS IDWOS:000345187300001
Subtype期刊论文
AbstractLight collection efficiency is an important factor that affects the performance of many optical and optoelectronic devices. In these devices, the high reflectivity of interfaces can hinder efficient light collection. To minimize unwanted reflection, anti-reflection surfaces can be fabricated by micro/nanopatterning. In this paper, we investigate the fabrication of broadband anti-reflection Si surfaces by laser micro/nanoprocessing. Laser direct writing is applied to create microstructures on Si surfaces that reduce light reflection by light trapping. In addition, laser interference lithography and metal assisted chemical etching are adopted to fabricate the Si nanowire arrays. The anti-reflection performance is greatly improved by the high aspect ratio subwavelength structures, which create gradients of refractive index from the ambient air to the substrate. Furthermore, by decoration of the Si nanowires with metallic nanoparticles, surface plasmon resonance can be used to further control the broadband reflections, reducing the reflection to below 1.0% across from 300 to 1200 nm. An average reflection of 0.8% is achieved.; Light collection efficiency is an important factor that affects the performance of many optical and optoelectronic devices. In these devices, the high reflectivity of interfaces can hinder efficient light collection. To minimize unwanted reflection, anti-reflection surfaces can be fabricated by micro/nanopatterning. In this paper, we investigate the fabrication of broadband anti-reflection Si surfaces by laser micro/nanoprocessing. Laser direct writing is applied to create microstructures on Si surfaces that reduce light reflection by light trapping. In addition, laser interference lithography and metal assisted chemical etching are adopted to fabricate the Si nanowire arrays. The anti-reflection performance is greatly improved by the high aspect ratio subwavelength structures, which create gradients of refractive index from the ambient air to the substrate. Furthermore, by decoration of the Si nanowires with metallic nanoparticles, surface plasmon resonance can be used to further control the broadband reflections, reducing the reflection to below 1.0% across from 300 to 1200 nm. An average reflection of 0.8% is achieved.
Citation statistics
Cited Times:147[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/6847
Collection微细加工光学技术国家重点实验室(开放室)
Corresponding AuthorHong, MH (reprint author), Natl Univ Singapore, Dept Elect & Comp Engn, 4 Engn Dr 3, Singapore 117576, Singapore.
Affiliation1.[Yang, Jing
2.Luo, Fangfang
3.Kao, Tsung Sheng
4.Ho, Ghim Wei
5.Hong, Minghui] Natl Univ Singapore, Dept Elect & Comp Engn, Singapore 117576, Singapore
6.[Yang, Jing
7.Teng, Jinghua] Agcy Sci Technol & Res, Inst Mat Res & Engn, Singapore 117602, Singapore
8.[Yang, Jing] Natl Univ Singapore, NUS Environm Res Inst, Singapore 117411, Singapore
9.[Li, Xiong
10.Luo, Xiangang] Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
Recommended Citation
GB/T 7714
Yang, Jing,Luo, Fangfang,Kao, Tsung Sheng,et al. Design and fabrication of broadband ultralow reflectivity black Si surfaces by laser micro/nanoprocessing[J]. LIGHT-SCIENCE & APPLICATIONS,2014,3.
APA Yang, Jing.,Luo, Fangfang.,Kao, Tsung Sheng.,Li, Xiong.,Ho, Ghim Wei.,...&Hong, MH .(2014).Design and fabrication of broadband ultralow reflectivity black Si surfaces by laser micro/nanoprocessing.LIGHT-SCIENCE & APPLICATIONS,3.
MLA Yang, Jing,et al."Design and fabrication of broadband ultralow reflectivity black Si surfaces by laser micro/nanoprocessing".LIGHT-SCIENCE & APPLICATIONS 3(2014).
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