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题名:
Off Axis Illumination Planar Hyperlens for Non-contacted Deep Subwavelength Demagnifying Lithography
作者: Zhang, Wei; Yao, Na; Wang, Changtao; Zhao, Zeyu; Wang, Yanqin; Gao, Ping; Luo, Xiangang
刊名: PLASMONICS
出版日期: 2014
卷号: 9, 期号:6, 页码:1333-1339
学科分类: Nanolithography; Surface plasmon; Illumination design
DOI: 10.1007/s11468-014-9746-8
通讯作者: Luo, XG (reprint author), Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, POB 350, Chengdu 610209, Peoples R China.
文章类型: 期刊论文
中文摘要: Off axis illumination (OAI) technique combined with planar hyperlens is applied to achieve the non-contacted deep subwavelength demagnifying lithography. The designed OAI is confirmed to shift the spatial spectra of mask, leading to enhancement of the featured wavevectors components. On the other hand, the reflection effect of Ag cladding is necessary to obtain high contrast and high fidelity of nanopattern lithography. It is numerically demonstrated that the half-pitch resolution 32 nm with OAI (NA = 1.37) is obtained under 80 nm air working distance, which is about six times than the case of the conventional configuration under normal illumination (NA = 0). Further simulations show that the minimum half-pitch resolution of the planar hyperlens with OAI could reach 18 nm (similar to lambda/20).
英文摘要: Off axis illumination (OAI) technique combined with planar hyperlens is applied to achieve the non-contacted deep subwavelength demagnifying lithography. The designed OAI is confirmed to shift the spatial spectra of mask, leading to enhancement of the featured wavevectors components. On the other hand, the reflection effect of Ag cladding is necessary to obtain high contrast and high fidelity of nanopattern lithography. It is numerically demonstrated that the half-pitch resolution 32 nm with OAI (NA = 1.37) is obtained under 80 nm air working distance, which is about six times than the case of the conventional configuration under normal illumination (NA = 0). Further simulations show that the minimum half-pitch resolution of the planar hyperlens with OAI could reach 18 nm (similar to lambda/20).
收录类别: SCI
项目资助者: 973 Program of China [2013CBA01700] ; National Natural Science Funds [61138002, 61177013]
语种: 英语
WOS记录号: WOS:000345146800010
ISSN号: 1557-1955
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内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/6846
Appears in Collections:微细加工光学技术国家重点实验室(开放室)_期刊论文

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作者单位: 1.[Zhang, Wei
2.Yao, Na
3.Wang, Changtao
4.Zhao, Zeyu
5.Wang, Yanqin
6.Gao, Ping
7.Luo, Xiangang] Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, Chengdu 610209, Peoples R China

Recommended Citation:
Zhang, Wei,Yao, Na,Wang, Changtao,et al. Off Axis Illumination Planar Hyperlens for Non-contacted Deep Subwavelength Demagnifying Lithography[J]. PLASMONICS,2014,9(6):1333-1339.
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