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题名:
Improving Imaging Contrast of Non-Contacted Plasmonic Lens by Off-Axis Illumination with High Numerical Aperture
作者: Huang, Qizhao; Wang, Changtao; Yao, Na; Zhao, Zeyu; Wang, Yanqin; Gao, Ping; Luo, Yunfei; Zhang, Wei; Wang, Hao; Luo, Xiangang
刊名: PLASMONICS
出版日期: 2014
卷号: 9, 期号:3, 页码:699-706
学科分类: Surface plasmons; Subwavelength structures; Superresolution
DOI: 10.1007/s11468-014-9689-0
通讯作者: Luo, XG (reprint author), Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, POB 350, Chengdu 610209, Peoples R China.
文章类型: 期刊论文
中文摘要: Off-axis illumination plasmonic lens (OAIPL) is proposed and demonstrated to improve the imaging contrast in non-contacted application manner. The spatial Fourier components of light transmitted through the nano-patterns are greatly enhanced in the imaging process by shifting the wave vectors with high numerical aperture off-axis illumination. On the other hand, a reflector in the image area helps to tailor the ratio between electric field components in the tangential and normal directions. These two effects resultantly deliver significant improvement of imaging performance, including enhanced resolution, imaging contrast, and elongation of air gap thickness. In comparison to the case of normal illumination, the air gap thickness for 30 and 60 nm half-pitch resolution is extended to 25 and 100 nm by OAIPL with numerical aperture (NA) = 1.55, respectively.
英文摘要: Off-axis illumination plasmonic lens (OAIPL) is proposed and demonstrated to improve the imaging contrast in non-contacted application manner. The spatial Fourier components of light transmitted through the nano-patterns are greatly enhanced in the imaging process by shifting the wave vectors with high numerical aperture off-axis illumination. On the other hand, a reflector in the image area helps to tailor the ratio between electric field components in the tangential and normal directions. These two effects resultantly deliver significant improvement of imaging performance, including enhanced resolution, imaging contrast, and elongation of air gap thickness. In comparison to the case of normal illumination, the air gap thickness for 30 and 60 nm half-pitch resolution is extended to 25 and 100 nm by OAIPL with numerical aperture (NA) = 1.55, respectively.
收录类别: SCI
项目资助者: 973 Program of China [2013CBA01700] ; National Natural Science Funds [61138002, 61177013]
语种: 英语
WOS记录号: WOS:000336021700028
ISSN号: 1557-1955
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/6844
Appears in Collections:微细加工光学技术国家重点实验室(开放室)_期刊论文

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作者单位: 1.[Huang, Qizhao
2.Wang, Changtao
3.Yao, Na
4.Zhao, Zeyu
5.Wang, Yanqin
6.Gao, Ping
7.Luo, Yunfei
8.Zhang, Wei
9.Luo, Xiangang] Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, Chengdu 610209, Peoples R China
10.[Huang, Qizhao
11.Wang, Hao] Univ Elect Sci & Technol China, Sch Mechatron Engn, Chengdu 611731, Peoples R China

Recommended Citation:
Huang, Qizhao,Wang, Changtao,Yao, Na,et al. Improving Imaging Contrast of Non-Contacted Plasmonic Lens by Off-Axis Illumination with High Numerical Aperture[J]. PLASMONICS,2014,9(3):699-706.
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