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Improving Imaging Contrast of Non-Contacted Plasmonic Lens by Off-Axis Illumination with High Numerical Aperture
Huang, Qizhao; Wang, Changtao; Yao, Na; Zhao, Zeyu; Wang, Yanqin; Gao, Ping; Luo, Yunfei; Zhang, Wei; Wang, Hao; Luo, Xiangang; Luo, XG (reprint author), Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, POB 350, Chengdu 610209, Peoples R China.
Source PublicationPLASMONICS
Volume9Issue:3Pages:699-706
2014
Language英语
ISSN1557-1955
DOI10.1007/s11468-014-9689-0
Indexed BySCI
WOS IDWOS:000336021700028
Subtype期刊论文
AbstractOff-axis illumination plasmonic lens (OAIPL) is proposed and demonstrated to improve the imaging contrast in non-contacted application manner. The spatial Fourier components of light transmitted through the nano-patterns are greatly enhanced in the imaging process by shifting the wave vectors with high numerical aperture off-axis illumination. On the other hand, a reflector in the image area helps to tailor the ratio between electric field components in the tangential and normal directions. These two effects resultantly deliver significant improvement of imaging performance, including enhanced resolution, imaging contrast, and elongation of air gap thickness. In comparison to the case of normal illumination, the air gap thickness for 30 and 60 nm half-pitch resolution is extended to 25 and 100 nm by OAIPL with numerical aperture (NA) = 1.55, respectively.; Off-axis illumination plasmonic lens (OAIPL) is proposed and demonstrated to improve the imaging contrast in non-contacted application manner. The spatial Fourier components of light transmitted through the nano-patterns are greatly enhanced in the imaging process by shifting the wave vectors with high numerical aperture off-axis illumination. On the other hand, a reflector in the image area helps to tailor the ratio between electric field components in the tangential and normal directions. These two effects resultantly deliver significant improvement of imaging performance, including enhanced resolution, imaging contrast, and elongation of air gap thickness. In comparison to the case of normal illumination, the air gap thickness for 30 and 60 nm half-pitch resolution is extended to 25 and 100 nm by OAIPL with numerical aperture (NA) = 1.55, respectively.
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Cited Times:10[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/6844
Collection微细加工光学技术国家重点实验室(开放室)
Corresponding AuthorLuo, XG (reprint author), Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, POB 350, Chengdu 610209, Peoples R China.
Affiliation1.[Huang, Qizhao
2.Wang, Changtao
3.Yao, Na
4.Zhao, Zeyu
5.Wang, Yanqin
6.Gao, Ping
7.Luo, Yunfei
8.Zhang, Wei
9.Luo, Xiangang] Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, Chengdu 610209, Peoples R China
10.[Huang, Qizhao
11.Wang, Hao] Univ Elect Sci & Technol China, Sch Mechatron Engn, Chengdu 611731, Peoples R China
Recommended Citation
GB/T 7714
Huang, Qizhao,Wang, Changtao,Yao, Na,et al. Improving Imaging Contrast of Non-Contacted Plasmonic Lens by Off-Axis Illumination with High Numerical Aperture[J]. PLASMONICS,2014,9(3):699-706.
APA Huang, Qizhao.,Wang, Changtao.,Yao, Na.,Zhao, Zeyu.,Wang, Yanqin.,...&Luo, XG .(2014).Improving Imaging Contrast of Non-Contacted Plasmonic Lens by Off-Axis Illumination with High Numerical Aperture.PLASMONICS,9(3),699-706.
MLA Huang, Qizhao,et al."Improving Imaging Contrast of Non-Contacted Plasmonic Lens by Off-Axis Illumination with High Numerical Aperture".PLASMONICS 9.3(2014):699-706.
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