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Hybrid plasmonic structures: Design and fabrication by laser means
Xu, Le1,2; Luo, Fang Fang1; Tan, Leng Seow1; Luo, Xian Gang3; Hong, Ming Hui1
Source PublicationIEEE Journal on Selected Topics in Quantum Electronics
Volume19Issue:3Pages:6296674
2013
Language英语
ISSN1077260X
DOI10.1109/JSTQE.2012.2217480
Indexed BySCI ; Ei
WOS IDWOS:000322125100004
Subtype期刊论文
AbstractDesign and fabrication of hybrid plasmonic structures by laser means are investigated to extend flexible tuning of optical properties of metallic micro/nano-structures for high-sensitivity detection and enhancement of solar cell antireflection performance for high energy-conversion efficiency. It is shown that the identical micro/nano-structures in well-defined arrays fabricated by laser interference lithography can be used as a versatile platform to enhance fluorescence intensity of the molecules. Meanwhile, postprocessing of such structures via thermal annealing can result in ordered clusters of nanodots 50 nm in average size, which enhances Raman scattering intensity. A dramatic reduction in silicon surface reflectance is achieved via pulsed fiber laser texturing. The suppression of reflectance can be further improved by decorating the laser-textured Si surface with metallic nanoparticles by thermal annealing of metallic thin films deposited on the Si surfaces. This hybrid plasmonic structure scheme can achieve broadband (300-1000 nm) antireflection with a surface reflection as low as 5.5%. The improved broadband antireflection of the surfaces could have applications in solar energy, renewable energy, and electrooptical devices. © 1995-2012 IEEE.; Design and fabrication of hybrid plasmonic structures by laser means are investigated to extend flexible tuning of optical properties of metallic micro/nano-structures for high-sensitivity detection and enhancement of solar cell antireflection performance for high energy-conversion efficiency. It is shown that the identical micro/nano-structures in well-defined arrays fabricated by laser interference lithography can be used as a versatile platform to enhance fluorescence intensity of the molecules. Meanwhile, postprocessing of such structures via thermal annealing can result in ordered clusters of nanodots 50 nm in average size, which enhances Raman scattering intensity. A dramatic reduction in silicon surface reflectance is achieved via pulsed fiber laser texturing. The suppression of reflectance can be further improved by decorating the laser-textured Si surface with metallic nanoparticles by thermal annealing of metallic thin films deposited on the Si surfaces. This hybrid plasmonic structure scheme can achieve broadband (300-1000 nm) antireflection with a surface reflection as low as 5.5%. The improved broadband antireflection of the surfaces could have applications in solar energy, renewable energy, and electrooptical devices. © 1995-2012 IEEE.
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/6837
Collection微细加工光学技术国家重点实验室(开放室)
Affiliation1. Department of Electrical and Computer Engineering, National University of Singapore, 117576 Singapore, Singapore
2. Data Storage Institute, Agency for Science, Technology and Research, 117608 Singapore, Singapore
3. State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
Recommended Citation
GB/T 7714
Xu, Le,Luo, Fang Fang,Tan, Leng Seow,et al. Hybrid plasmonic structures: Design and fabrication by laser means[J]. IEEE Journal on Selected Topics in Quantum Electronics,2013,19(3):6296674.
APA Xu, Le,Luo, Fang Fang,Tan, Leng Seow,Luo, Xian Gang,&Hong, Ming Hui.(2013).Hybrid plasmonic structures: Design and fabrication by laser means.IEEE Journal on Selected Topics in Quantum Electronics,19(3),6296674.
MLA Xu, Le,et al."Hybrid plasmonic structures: Design and fabrication by laser means".IEEE Journal on Selected Topics in Quantum Electronics 19.3(2013):6296674.
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