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Subwavelength Demagnification Imaging and Lithography Using Hyperlens with a Plasmonic Reflector Layer
Ren, Guowei; Wang, Changtao; Yi, Guangwei; Tao, Xing; Luo, Xiangang; Luo, XG (reprint author), Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, POB 350, Chengdu 610209, Peoples R China.
Source PublicationPLASMONICS
Volume8Issue:2Pages:1065-1072
2013
Language英语
ISSN1557-1955
DOI10.1007/s11468-013-9510-5
Indexed BySCI
WOS IDWOS:000320445700118
Subtype期刊论文
AbstractUnlike the case in magnification mode, it is found that hyperlens employed in demagnification and lithography manner encounters great degradation of imaging quality especially for high-resolution image features. This problem mainly arises from the transversal magnetic polarization feature of light which delivers reduced contrast of electronic components intensity profile at the imaging region. Hyperlens with plasmonic reflector layer is designed for subwavelength demagnification imaging and photolithography. Analytical equations and numerical simulations show amplification of reflected evanescent waves in photoresist sandwiched by hyperlens and plasmonic reflectors in cylindrical geometry. The image quality features including resolution, contrast, and intensity can be improved significantly. Also presented are the dependence and influence of geometry parameters on imaging quality. Numerical demonstrations are given with about 15 nm half-pitch resolution imaging at illuminating wavelength of 365 nm.; Unlike the case in magnification mode, it is found that hyperlens employed in demagnification and lithography manner encounters great degradation of imaging quality especially for high-resolution image features. This problem mainly arises from the transversal magnetic polarization feature of light which delivers reduced contrast of electronic components intensity profile at the imaging region. Hyperlens with plasmonic reflector layer is designed for subwavelength demagnification imaging and photolithography. Analytical equations and numerical simulations show amplification of reflected evanescent waves in photoresist sandwiched by hyperlens and plasmonic reflectors in cylindrical geometry. The image quality features including resolution, contrast, and intensity can be improved significantly. Also presented are the dependence and influence of geometry parameters on imaging quality. Numerical demonstrations are given with about 15 nm half-pitch resolution imaging at illuminating wavelength of 365 nm.
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Cited Times:17[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/6830
Collection微细加工光学技术国家重点实验室(开放室)
Corresponding AuthorLuo, XG (reprint author), Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, POB 350, Chengdu 610209, Peoples R China.
Affiliation1.[Ren, Guowei
2.Wang, Changtao
3.Yi, Guangwei
4.Tao, Xing
5.Luo, Xiangang] Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, Chengdu 610209, Peoples R China
Recommended Citation
GB/T 7714
Ren, Guowei,Wang, Changtao,Yi, Guangwei,et al. Subwavelength Demagnification Imaging and Lithography Using Hyperlens with a Plasmonic Reflector Layer[J]. PLASMONICS,2013,8(2):1065-1072.
APA Ren, Guowei,Wang, Changtao,Yi, Guangwei,Tao, Xing,Luo, Xiangang,&Luo, XG .(2013).Subwavelength Demagnification Imaging and Lithography Using Hyperlens with a Plasmonic Reflector Layer.PLASMONICS,8(2),1065-1072.
MLA Ren, Guowei,et al."Subwavelength Demagnification Imaging and Lithography Using Hyperlens with a Plasmonic Reflector Layer".PLASMONICS 8.2(2013):1065-1072.
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