| Deep sub-wavelength imaging lithography by a reflective plasmonic slab | |
| Wang, Changtao; Gao, Ping; Zhao, Zeyu; Yao, Na; Wang, Yanqin; Liu, Ling; Liu, Kaipeng; Luo, Xiangang | |
| Source Publication | Optics Express
 |
| Volume | 21Issue:18Pages:20683-20691 |
| 2013 | |
| Language | 英语 |
| DOI | 10.1364/OE.21.020683 |
| Indexed By | SCI ; Ei |
| WOS ID | WOS:000324867100034 |
| Subtype | 期刊论文 |
| Abstract | By utilizing a reflective plasmonic slab, it is demonstrated numerically and experimentally in this paper deep sub-wavelength imaging lithography for nano characters with about 50nm line width and dense lines with 32nm half pitch resolution (about 1/12 wavelength). Compared with the control experiment without reflective plasmonic slab, resolution and fidelity of imaged resist patterns are remarkably improved especially for isolated nano features. Further numerical simulations show that near field optical proximity corrections help to improve imaging fidelity of two dimensional nano patterns. ©2013 Optical Society of America.; By utilizing a reflective plasmonic slab, it is demonstrated numerically and experimentally in this paper deep sub-wavelength imaging lithography for nano characters with about 50nm line width and dense lines with 32nm half pitch resolution (about 1/12 wavelength). Compared with the control experiment without reflective plasmonic slab, resolution and fidelity of imaged resist patterns are remarkably improved especially for isolated nano features. Further numerical simulations show that near field optical proximity corrections help to improve imaging fidelity of two dimensional nano patterns. ©2013 Optical Society of America. |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/6826 |
| Collection | 微细加工光学技术国家重点实验室（开放室） |
| Affiliation | State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O.box 350, Chengdu 610209, China |
| Recommended Citation GB/T 7714 | Wang, Changtao,Gao, Ping,Zhao, Zeyu,et al. Deep sub-wavelength imaging lithography by a reflective plasmonic slab[J]. Optics Express,2013,21(18):20683-20691. |
| APA | Wang, Changtao.,Gao, Ping.,Zhao, Zeyu.,Yao, Na.,Wang, Yanqin.,...&Luo, Xiangang.(2013).Deep sub-wavelength imaging lithography by a reflective plasmonic slab.Optics Express,21(18),20683-20691. |
| MLA | Wang, Changtao,et al."Deep sub-wavelength imaging lithography by a reflective plasmonic slab".Optics Express 21.18(2013):20683-20691. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2013-2094.pdf（2570KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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