题名: Deep sub-wavelength imaging lithography by a reflective plasmonic slab
作者: Wang, Changtao ; Gao, Ping ; Zhao, Zeyu ; Yao, Na ; Wang, Yanqin ; Liu, Ling ; Liu, Kaipeng ; Luo, Xiangang
刊名: Optics Express
出版日期: 2013
卷号: 21, 期号: 18, 页码: 20683-20691 学科分类: Photoresists
DOI: 10.1364/OE.21.020683
文章类型: 期刊论文
中文摘要: By utilizing a reflective plasmonic slab, it is demonstrated numerically and experimentally in this paper deep sub-wavelength imaging lithography for nano characters with about 50nm line width and dense lines with 32nm half pitch resolution (about 1/12 wavelength). Compared with the control experiment without reflective plasmonic slab, resolution and fidelity of imaged resist patterns are remarkably improved especially for isolated nano features. Further numerical simulations show that near field optical proximity corrections help to improve imaging fidelity of two dimensional nano patterns. ©2013 Optical Society of America. 英文摘要: By utilizing a reflective plasmonic slab, it is demonstrated numerically and experimentally in this paper deep sub-wavelength imaging lithography for nano characters with about 50nm line width and dense lines with 32nm half pitch resolution (about 1/12 wavelength). Compared with the control experiment without reflective plasmonic slab, resolution and fidelity of imaged resist patterns are remarkably improved especially for isolated nano features. Further numerical simulations show that near field optical proximity corrections help to improve imaging fidelity of two dimensional nano patterns. ©2013 Optical Society of America. 收录类别: SCI
; Ei
项目资助者: 973 Program of China [2011CB301800]
; Chinese Nature Science Grant [61138002, 61177013]
语种: 英语
WOS记录号: WOS:000324867100034
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内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/6826
Appears in Collections: 微细加工光学技术国家重点实验室（开放室）_期刊论文
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作者单位: State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O.box 350, Chengdu 610209, China
Recommended Citation:
Wang, Changtao,Gao, Ping,Zhao, Zeyu,et al. Deep sub-wavelength imaging lithography by a reflective plasmonic slab[J]. Optics Express,2013,21(18):20683-20691.
