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Demagnifying far field focusing spot to deep subwavelength scale by truncated hyperlens for nanolithography
Yao, Na; Wang, Changtao; Ren, Guowei; Zhao, Zeyu; Feng, Qin; Luo, Xiangang; Luo, X. (lxg@ioe.ac.cn)
Source PublicationSuperlattices and Microstructures
Volume52Issue:1Pages:63-69
2012
Language英语
ISSN07496036
DOI10.1016/j.spmi.2012.04.003
Indexed ByEi
WOS IDWOS:000305775700008
Subtype期刊论文
AbstractA truncated hyperlens composed of pairs of metal-dielectric cylindrical multilayers is proposed to demagnify the diffraction limited spot to achieve deep subwavelength imaging. The diffraction limited spot is focused by far field converging cylindrical wave. Numerical simulations demonstrate that full width at half maximum (FWHM) of the image down to 32 nm (∼λ/11) can be achieved from object (∼λ/3) by 365 nm light illumination. It is discussed that the influence of size and focusing shift of the spot on those of the demagnification image on photoresist. It is also demonstrated that multi-objects can be demagnified and projected on the photoresist. © 2012 Elsevier Ltd. All rights reserved.; A truncated hyperlens composed of pairs of metal-dielectric cylindrical multilayers is proposed to demagnify the diffraction limited spot to achieve deep subwavelength imaging. The diffraction limited spot is focused by far field converging cylindrical wave. Numerical simulations demonstrate that full width at half maximum (FWHM) of the image down to 32 nm (∼λ/11) can be achieved from object (∼λ/3) by 365 nm light illumination. It is discussed that the influence of size and focusing shift of the spot on those of the demagnification image on photoresist. It is also demonstrated that multi-objects can be demagnified and projected on the photoresist. © 2012 Elsevier Ltd. All rights reserved.
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/6807
Collection微细加工光学技术国家重点实验室(开放室)
Corresponding AuthorLuo, X. (lxg@ioe.ac.cn)
Affiliation State Key Lab of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu 610209, China
Recommended Citation
GB/T 7714
Yao, Na,Wang, Changtao,Ren, Guowei,et al. Demagnifying far field focusing spot to deep subwavelength scale by truncated hyperlens for nanolithography[J]. Superlattices and Microstructures,2012,52(1):63-69.
APA Yao, Na.,Wang, Changtao.,Ren, Guowei.,Zhao, Zeyu.,Feng, Qin.,...&Luo, X. .(2012).Demagnifying far field focusing spot to deep subwavelength scale by truncated hyperlens for nanolithography.Superlattices and Microstructures,52(1),63-69.
MLA Yao, Na,et al."Demagnifying far field focusing spot to deep subwavelength scale by truncated hyperlens for nanolithography".Superlattices and Microstructures 52.1(2012):63-69.
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