中国科学院光电技术研究所机构知识库
Advanced  
IOE OpenIR  > 微细加工光学技术国家重点实验室(开放室)  > 期刊论文
题名:
Demagnifying far field focusing spot to deep subwavelength scale by truncated hyperlens for nanolithography
作者: Yao, Na; Wang, Changtao; Ren, Guowei; Zhao, Zeyu; Feng, Qin; Luo, Xiangang
刊名: Superlattices and Microstructures
出版日期: 2012
卷号: 52, 期号:1, 页码:63-69
学科分类: Diffraction - Photolithography
DOI: 10.1016/j.spmi.2012.04.003
通讯作者: Luo, X. (lxg@ioe.ac.cn)
文章类型: 期刊论文
中文摘要: A truncated hyperlens composed of pairs of metal-dielectric cylindrical multilayers is proposed to demagnify the diffraction limited spot to achieve deep subwavelength imaging. The diffraction limited spot is focused by far field converging cylindrical wave. Numerical simulations demonstrate that full width at half maximum (FWHM) of the image down to 32 nm (∼λ/11) can be achieved from object (∼λ/3) by 365 nm light illumination. It is discussed that the influence of size and focusing shift of the spot on those of the demagnification image on photoresist. It is also demonstrated that multi-objects can be demagnified and projected on the photoresist. © 2012 Elsevier Ltd. All rights reserved.
英文摘要: A truncated hyperlens composed of pairs of metal-dielectric cylindrical multilayers is proposed to demagnify the diffraction limited spot to achieve deep subwavelength imaging. The diffraction limited spot is focused by far field converging cylindrical wave. Numerical simulations demonstrate that full width at half maximum (FWHM) of the image down to 32 nm (∼λ/11) can be achieved from object (∼λ/3) by 365 nm light illumination. It is discussed that the influence of size and focusing shift of the spot on those of the demagnification image on photoresist. It is also demonstrated that multi-objects can be demagnified and projected on the photoresist. © 2012 Elsevier Ltd. All rights reserved.
收录类别: Ei
项目资助者: 973 Program of China [2011CB301800] ; Natural Science Foundation of China [60825405, 61138002, 61177013]
语种: 英语
WOS记录号: WOS:000305775700008
ISSN号: 07496036
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/6807
Appears in Collections:微细加工光学技术国家重点实验室(开放室)_期刊论文

Files in This Item:
File Name/ File Size Content Type Version Access License
2012-2054.pdf(846KB)期刊论文作者接受稿开放获取View 联系获取全文

作者单位: State Key Lab of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu 610209, China

Recommended Citation:
Yao, Na,Wang, Changtao,Ren, Guowei,et al. Demagnifying far field focusing spot to deep subwavelength scale by truncated hyperlens for nanolithography[J]. Superlattices and Microstructures,2012,52(1):63-69.
Service
Recommend this item
Sava as my favorate item
Show this item's statistics
Export Endnote File
Google Scholar
Similar articles in Google Scholar
[Yao, Na]'s Articles
[Wang, Changtao]'s Articles
[Ren, Guowei]'s Articles
CSDL cross search
Similar articles in CSDL Cross Search
[Yao, Na]‘s Articles
[Wang, Changtao]‘s Articles
[Ren, Guowei]‘s Articles
Related Copyright Policies
Null
Social Bookmarking
Add to CiteULike Add to Connotea Add to Del.icio.us Add to Digg Add to Reddit
文件名: 2012-2054.pdf
格式: Adobe PDF
所有评论 (0)
暂无评论
 
评注功能仅针对注册用户开放,请您登录
您对该条目有什么异议,请填写以下表单,管理员会尽快联系您。
内 容:
Email:  *
单位:
验证码:   刷新
您在IR的使用过程中有什么好的想法或者建议可以反馈给我们。
标 题:
 *
内 容:
Email:  *
验证码:   刷新

Items in IR are protected by copyright, with all rights reserved, unless otherwise indicated.

 

 

Valid XHTML 1.0!
Copyright © 2007-2016  中国科学院光电技术研究所 - Feedback
Powered by CSpace