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Improving resolution of superlens lithography by phase-shifting mask
Yao Na; Lai Zian; Fang Liang; Wang Changtao; Feng Qin; Zhao Zheyu; Luo Xiangang; Yao N (Yao Na)
Source PublicationOPTICS EXPRESS
Volume19Issue:17Pages:15982-15989
2011
Language英语
Subtype期刊论文
AbstractWe propose to apply phase-shifting mask (PSM) to superlens lithography to improve its resolution. The PSM comprises of chromium slits alternatively filled by Ag and PMMA. The pi-phase shift is induced whereas thEir transmittance of electric intensity is almost equal for two nEighboring slits. The destructive interference between two slits has greatly improved the spatial resolution and image fidelity. For representative configurations of superlens lithography, FDTD numerical simulations demonstrate that two slits with center-to-center distance d = 35 nm (similar to lambda/10) can be resolved in PSM design, compared to 60 nm (similar to lambda/6) without the PSM. (C)2011 Optical Society of America; We propose to apply phase-shifting mask (PSM) to superlens lithography to improve its resolution. The PSM comprises of chromium slits alternatively filled by Ag and PMMA. The pi-phase shift is induced whereas thEir transmittance of electric intensity is almost equal for two nEighboring slits. The destructive interference between two slits has greatly improved the spatial resolution and image fidelity. For representative configurations of superlens lithography, FDTD numerical simulations demonstrate that two slits with center-to-center distance d = 35 nm (similar to lambda/10) can be resolved in PSM design, compared to 60 nm (similar to lambda/6) without the PSM. (C)2011 Optical Society of America
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/6761
Collection微细加工光学技术国家重点实验室(开放室)
Corresponding AuthorYao N (Yao Na)
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
Yao Na,Lai Zian,Fang Liang,et al. Improving resolution of superlens lithography by phase-shifting mask[J]. OPTICS EXPRESS,2011,19(17):15982-15989.
APA Yao Na.,Lai Zian.,Fang Liang.,Wang Changtao.,Feng Qin.,...&Yao N .(2011).Improving resolution of superlens lithography by phase-shifting mask.OPTICS EXPRESS,19(17),15982-15989.
MLA Yao Na,et al."Improving resolution of superlens lithography by phase-shifting mask".OPTICS EXPRESS 19.17(2011):15982-15989.
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