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题名:
Deep subwavelength photolithography based on surface plasmon polariton resonance with metallic grating waveguide heterostructure
作者: Xuefeng Yang; Liang Fang; Beibei Zeng; Changtao Wang; Qin Feng; Xiangang Luo
刊名: Journal of Optics (UK)
出版日期: 2010
卷号: 12, 期号:4, 页码:045001
通讯作者: Xuefeng Yang
文章类型: 期刊论文
中文摘要: Deep subwavelength photolithography with a metallic grating waveguide heterostructure (MGWHS) is presented and numerically demonstrated by a finite-difference time-domain method. This lithography scheme is demonstrated by interference between the diffracted waves of the mask which are enhanced by the surface plasmon polariton (SPP) resonance in this MGWHS. The relationship between the pattern resolution and the thickness of the photoresist is discussed. With proper choices of the dimensions of the proposed MGWHS and the illumination light, either a deep subwavelength (~ lambda /17) pattern with sufficient contrast or a high quality interference pattern can be achieved. This approach is suitable for application to deep subwavelength photolithography without expensive equipment.
英文摘要: Deep subwavelength photolithography with a metallic grating waveguide heterostructure (MGWHS) is presented and numerically demonstrated by a finite-difference time-domain method. This lithography scheme is demonstrated by interference between the diffracted waves of the mask which are enhanced by the surface plasmon polariton (SPP) resonance in this MGWHS. The relationship between the pattern resolution and the thickness of the photoresist is discussed. With proper choices of the dimensions of the proposed MGWHS and the illumination light, either a deep subwavelength (~ lambda /17) pattern with sufficient contrast or a high quality interference pattern can be achieved. This approach is suitable for application to deep subwavelength photolithography without expensive equipment.
语种: 英语
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/6714
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作者单位: 中国科学院光电技术研究所

Recommended Citation:
Xuefeng Yang,Liang Fang,Beibei Zeng,et al. Deep subwavelength photolithography based on surface plasmon polariton resonance with metallic grating waveguide heterostructure[J]. Journal of Optics (UK),2010,12(4):045001.
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