IOE OpenIR  > 微细加工光学技术国家重点实验室(开放室)
Deep subwavelength photolithography based on surface plasmon polariton resonance with metallic grating waveguide heterostructure
Xuefeng Yang; Liang Fang; Beibei Zeng; Changtao Wang; Qin Feng; Xiangang Luo
Source PublicationJournal of Optics (UK)
Volume12Issue:4Pages:045001
2010
Language英语
Subtype期刊论文
AbstractDeep subwavelength photolithography with a metallic grating waveguide heterostructure (MGWHS) is presented and numerically demonstrated by a finite-difference time-domain method. This lithography scheme is demonstrated by interference between the diffracted waves of the mask which are enhanced by the surface plasmon polariton (SPP) resonance in this MGWHS. The relationship between the pattern resolution and the thickness of the photoresist is discussed. With proper choices of the dimensions of the proposed MGWHS and the illumination light, either a deep subwavelength (~ lambda /17) pattern with sufficient contrast or a high quality interference pattern can be achieved. This approach is suitable for application to deep subwavelength photolithography without expensive equipment.; Deep subwavelength photolithography with a metallic grating waveguide heterostructure (MGWHS) is presented and numerically demonstrated by a finite-difference time-domain method. This lithography scheme is demonstrated by interference between the diffracted waves of the mask which are enhanced by the surface plasmon polariton (SPP) resonance in this MGWHS. The relationship between the pattern resolution and the thickness of the photoresist is discussed. With proper choices of the dimensions of the proposed MGWHS and the illumination light, either a deep subwavelength (~ lambda /17) pattern with sufficient contrast or a high quality interference pattern can be achieved. This approach is suitable for application to deep subwavelength photolithography without expensive equipment.
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/6714
Collection微细加工光学技术国家重点实验室(开放室)
Corresponding AuthorXuefeng Yang
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
Xuefeng Yang,Liang Fang,Beibei Zeng,et al. Deep subwavelength photolithography based on surface plasmon polariton resonance with metallic grating waveguide heterostructure[J]. Journal of Optics (UK),2010,12(4):045001.
APA Xuefeng Yang,Liang Fang,Beibei Zeng,Changtao Wang,Qin Feng,&Xiangang Luo.(2010).Deep subwavelength photolithography based on surface plasmon polariton resonance with metallic grating waveguide heterostructure.Journal of Optics (UK),12(4),045001.
MLA Xuefeng Yang,et al."Deep subwavelength photolithography based on surface plasmon polariton resonance with metallic grating waveguide heterostructure".Journal of Optics (UK) 12.4(2010):045001.
Files in This Item:
File Name/Size DocType Version Access License
2010-106.pdf(735KB)期刊论文作者接受稿开放获取CC BY-NC-SAView Application Full Text
Related Services
Recommend this item
Bookmark
Usage statistics
Export to Endnote
Google Scholar
Similar articles in Google Scholar
[Xuefeng Yang]'s Articles
[Liang Fang]'s Articles
[Beibei Zeng]'s Articles
Baidu academic
Similar articles in Baidu academic
[Xuefeng Yang]'s Articles
[Liang Fang]'s Articles
[Beibei Zeng]'s Articles
Bing Scholar
Similar articles in Bing Scholar
[Xuefeng Yang]'s Articles
[Liang Fang]'s Articles
[Beibei Zeng]'s Articles
Terms of Use
No data!
Social Bookmark/Share
File name: 2010-106.pdf
Format: Adobe PDF
All comments (0)
No comment.
 

Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.