For the experiments of surface plasmon polaritons (SPPs) interference lithography based on attenuated total reflection-coupling mode to be done conveniently, we introduce a backside-exposure technique in this paper. The physical mechanisms of SPPs interference with the backside -exposure method are studied and the interference fringes with feature size below 65 nm are experimentally obtained. The technique can be used to fabricate nanostructures conveniently with large area, and avoids the difficulties for seeking high refractive prism and matching fluid.
英文摘要:
For the experiments of surface plasmon polaritons (SPPs) interference lithography based on attenuated total reflection-coupling mode to be done conveniently, we introduce a backside-exposure technique in this paper. The physical mechanisms of SPPs interference with the backside -exposure method are studied and the interference fringes with feature size below 65 nm are experimentally obtained. The technique can be used to fabricate nanostructures conveniently with large area, and avoids the difficulties for seeking high refractive prism and matching fluid.
