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A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique
Mingyang He; Zhiyou Zhang; Sha Shi; Jinglei Du; Xupeng Li; Shuhong Li; Wenying Ma
Source PublicationOptics Express
Volume18Issue:15Pages:15975-15980
2010
Language英语
Subtype期刊论文
AbstractFor the experiments of surface plasmon polaritons (SPPs) interference lithography based on attenuated total reflection-coupling mode to be done conveniently, we introduce a backside-exposure technique in this paper. The physical mechanisms of SPPs interference with the backside -exposure method are studied and the interference fringes with feature size below 65 nm are experimentally obtained. The technique can be used to fabricate nanostructures conveniently with large area, and avoids the difficulties for seeking high refractive prism and matching fluid.; For the experiments of surface plasmon polaritons (SPPs) interference lithography based on attenuated total reflection-coupling mode to be done conveniently, we introduce a backside-exposure technique in this paper. The physical mechanisms of SPPs interference with the backside -exposure method are studied and the interference fringes with feature size below 65 nm are experimentally obtained. The technique can be used to fabricate nanostructures conveniently with large area, and avoids the difficulties for seeking high refractive prism and matching fluid.
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/6713
Collection微细加工光学技术国家重点实验室(开放室)
Corresponding AuthorMingyang He
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
Mingyang He,Zhiyou Zhang,Sha Shi,et al. A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique[J]. Optics Express,2010,18(15):15975-15980.
APA Mingyang He.,Zhiyou Zhang.,Sha Shi.,Jinglei Du.,Xupeng Li.,...&Wenying Ma.(2010).A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique.Optics Express,18(15),15975-15980.
MLA Mingyang He,et al."A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique".Optics Express 18.15(2010):15975-15980.
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