| A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique | |
| Mingyang He; Zhiyou Zhang; Sha Shi; Jinglei Du; Xupeng Li; Shuhong Li; Wenying Ma | |
| Source Publication | Optics Express
 |
| Volume | 18Issue:15Pages:15975-15980 |
| 2010 | |
| Language | 英语 |
| Subtype | 期刊论文 |
| Abstract | For the experiments of surface plasmon polaritons (SPPs) interference lithography based on attenuated total reflection-coupling mode to be done conveniently, we introduce a backside-exposure technique in this paper. The physical mechanisms of SPPs interference with the backside -exposure method are studied and the interference fringes with feature size below 65 nm are experimentally obtained. The technique can be used to fabricate nanostructures conveniently with large area, and avoids the difficulties for seeking high refractive prism and matching fluid.; For the experiments of surface plasmon polaritons (SPPs) interference lithography based on attenuated total reflection-coupling mode to be done conveniently, we introduce a backside-exposure technique in this paper. The physical mechanisms of SPPs interference with the backside -exposure method are studied and the interference fringes with feature size below 65 nm are experimentally obtained. The technique can be used to fabricate nanostructures conveniently with large area, and avoids the difficulties for seeking high refractive prism and matching fluid. |
| Document Type | 期刊论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/6713 |
| Collection | 微细加工光学技术国家重点实验室（开放室） |
| Corresponding Author | Mingyang He |
| Affiliation | 中国科学院光电技术研究所 |
| Recommended Citation GB/T 7714 | Mingyang He,Zhiyou Zhang,Sha Shi,et al. A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique[J]. Optics Express,2010,18(15):15975-15980. |
| APA | Mingyang He.,Zhiyou Zhang.,Sha Shi.,Jinglei Du.,Xupeng Li.,...&Wenying Ma.(2010).A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique.Optics Express,18(15),15975-15980. |
| MLA | Mingyang He,et al."A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique".Optics Express 18.15(2010):15975-15980. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2010-101.pdf（905KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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