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题名:
Plasmonic interference nanolithography with a double-layer planar silver lens structure
作者: Zeng BEibEi; Yang Xufeng; Wang Changtao; Luo Xiangang
刊名: Optics Express
出版日期: 2009
卷号: 17, 期号:19, 页码:16783-16791
通讯作者: Zeng BEibEi
文章类型: 期刊论文
中文摘要: We present here a surface plasmon interference lithography method with double-layer planar silver lens. This kind of lithography method provides interference patterns with sufficient contrast for lithography process and simple structure for the convenience of fabrication. Rigorous coupled wave analysis method has been performed with practical parameters to testify this lithography scheme. Furthermore, some key factors influencing the pattern quality have been discussed. It is pointed out that three factors mainly determine the resolution of the interference patterns, and therefore we give a theoretical resolution limit of about 1/12 wavelength to the surface plasmon interference lithography method.
英文摘要: We present here a surface plasmon interference lithography method with double-layer planar silver lens. This kind of lithography method provides interference patterns with sufficient contrast for lithography process and simple structure for the convenience of fabrication. Rigorous coupled wave analysis method has been performed with practical parameters to testify this lithography scheme. Furthermore, some key factors influencing the pattern quality have been discussed. It is pointed out that three factors mainly determine the resolution of the interference patterns, and therefore we give a theoretical resolution limit of about 1/12 wavelength to the surface plasmon interference lithography method.
收录类别: SCI ; Ei
语种: 英语
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/6697
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作者单位: 中国科学院光电技术研究所

Recommended Citation:
Zeng BEibEi,Yang Xufeng,Wang Changtao,et al. Plasmonic interference nanolithography with a double-layer planar silver lens structure[J]. Optics Express,2009,17(19):16783-16791.
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