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题名:
Improved near field lithography by surface plasmon resonance in groove-patterned masks
作者: Zeng BEibEi; Pan Li; Liu Ling; Fang Liang; Wang Changtao; Luo Xiangang
刊名: Journal of Optics A:Pure and Applied Optics
出版日期: 2009
卷号: 11, 期号:12
通讯作者: Zeng BB (Zeng BEibEi)
文章类型: 期刊论文
中文摘要: Near field lithography (NFL) provides an effective way for obtaining lithography features' sizes far beyond the diffraction limit. However, optical transmission through isolated subwavelength apertures is very low in the lithography process. It also makes it difficult to obtain a uniform lithography pattern where isolated and arrayed slit structures coexist because of different optical transmission through these two kinds of structures. It is proposed in this paper that using appropriately designed groove structures around subwavelength metallic slits could solve this problem. Numerical calculations performed by the finite-difference time-domain (FDTD) method demonstrate that about ten times transmission enhancement could be obtained. This occurs as a surface plasmon is resonantly excited and light is concentrated into nanometer scale apertures, resulting in not only greatly enhanced NFL efficiency but also uniform distribution of light intensity for isolated and arrayed slit patterns. Also discussed is the enhancement dependence on the structural parameters of NFL masks.
英文摘要: Near field lithography (NFL) provides an effective way for obtaining lithography features' sizes far beyond the diffraction limit. However, optical transmission through isolated subwavelength apertures is very low in the lithography process. It also makes it difficult to obtain a uniform lithography pattern where isolated and arrayed slit structures coexist because of different optical transmission through these two kinds of structures. It is proposed in this paper that using appropriately designed groove structures around subwavelength metallic slits could solve this problem. Numerical calculations performed by the finite-difference time-domain (FDTD) method demonstrate that about ten times transmission enhancement could be obtained. This occurs as a surface plasmon is resonantly excited and light is concentrated into nanometer scale apertures, resulting in not only greatly enhanced NFL efficiency but also uniform distribution of light intensity for isolated and arrayed slit patterns. Also discussed is the enhancement dependence on the structural parameters of NFL masks.
收录类别: SCI ; Ei
语种: 英语
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/6696
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作者单位: 中国科学院光电技术研究所

Recommended Citation:
Zeng BEibEi,Pan Li,Liu Ling,et al. Improved near field lithography by surface plasmon resonance in groove-patterned masks[J]. Journal of Optics A:Pure and Applied Optics,2009,11(12).
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