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题名:
Subwavelength nanolithography based on unidirectional excitation of surface plasmons
作者: Xu T; Fang L; Zeng BB; et al.
刊名: JOURNAL OF OPTICS A-PURE AND APPLIED OPTICS
出版日期: 2009
卷号: 11, 期号:8, 页码:085003
通讯作者: Xu T
文章类型: 期刊论文
中文摘要: A subwavelength nanolithography technique based on unidirectional excitation of surface plasmons is proposed and numerically demonstrated by finite-difference time-domain analysis. Normal incident light impinging on a specially designed mask can excite two unidirectional surface plasmon waves (SPWs) with counter propagating directions on the unilluminated side. The simulation results show that the interference of these face-to-face SPWs launched by the mask could deliver about 50 nm half-pitch patterns at the operating wavelength of 365 nm, going far beyond the free space diffraction limit. This technique provides an effective fabrication method for nanostructures.
英文摘要: A subwavelength nanolithography technique based on unidirectional excitation of surface plasmons is proposed and numerically demonstrated by finite-difference time-domain analysis. Normal incident light impinging on a specially designed mask can excite two unidirectional surface plasmon waves (SPWs) with counter propagating directions on the unilluminated side. The simulation results show that the interference of these face-to-face SPWs launched by the mask could deliver about 50 nm half-pitch patterns at the operating wavelength of 365 nm, going far beyond the free space diffraction limit. This technique provides an effective fabrication method for nanostructures.
收录类别: SCI ; Ei
语种: 英语
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/6691
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作者单位: 中国科学院光电技术研究所

Recommended Citation:
Xu T,Fang L,Zeng BB,et al. Subwavelength nanolithography based on unidirectional excitation of surface plasmons[J]. JOURNAL OF OPTICS A-PURE AND APPLIED OPTICS,2009,11(8):085003.
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