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题名:
Disordered antireflective subwavelength structures using Ag nanoparticles on fused silica windows
作者: Shang, Peng1,2; Xiong, Sheng Ming1; Deng, Qi Ling1; Shi, Li Fang1; Zhang, Mian1
刊名: Applied Optics
出版日期: 2014
卷号: 53, 期号:29, 页码:6789-6796
学科分类: Fused silica - Light transmission - Nanoparticles - Optical multilayers - Tantalum oxides
DOI: 10.1364/AO.53.006789
通讯作者: Shang, Peng
文章类型: 期刊论文
中文摘要: In this paper, we have demonstrated an effective method for fabricating disordered subwavelength structures (d-SWSs) on fused silica using thermal dewetted Ag nanoparticles at lower temperatures (ave ~ 95.6%) over a wide wavelength region of 500-1300 nm were obtained, and a maximum value of ~96% at a wavelength of 850 nm was also obtained. Furthermore, the d-SWSs exhibit excellent optical and thermal stability at high temperatures of 800°C and 1000°C compared to a conventional Ta2O5/SiO2 multilayer coating. © 2014 Optical Society of America.
英文摘要: In this paper, we have demonstrated an effective method for fabricating disordered subwavelength structures (d-SWSs) on fused silica using thermal dewetted Ag nanoparticles at lower temperatures (ave ~ 95.6%) over a wide wavelength region of 500-1300 nm were obtained, and a maximum value of ~96% at a wavelength of 850 nm was also obtained. Furthermore, the d-SWSs exhibit excellent optical and thermal stability at high temperatures of 800°C and 1000°C compared to a conventional Ta2O5/SiO2 multilayer coating. © 2014 Optical Society of America.
收录类别: SCI ; Ei
语种: 英语
WOS记录号: WOS:000343160200058
ISSN号: 1559-128X
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/6631
Appears in Collections:薄膜光学技术研究室(十一室)_期刊论文

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作者单位: 1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China
2. Graduate School of the Chinese Academy of Sciences, Beijing, China

Recommended Citation:
Shang, Peng,Xiong, Sheng Ming,Deng, Qi Ling,et al. Disordered antireflective subwavelength structures using Ag nanoparticles on fused silica windows[J]. Applied Optics,2014,53(29):6789-6796.
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