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题名:
Investigation on thermal stability of Ta2O5, TiO 2 and Al2O3 coatings for application at high temperature
作者: Shang, Peng1,2; Xiong, Shengming1; Li, Linghui1; Tian, Dong1; Ai, Wanjun1
刊名: Applied Surface Science
出版日期: 2013
卷号: 285, 期号:PARTB, 页码:713-720
学科分类: Aluminum - Coatings - Oxide minerals - Stress concentration - Tantalum oxides - Thermodynamic stability - Titanium dioxide
DOI: 10.1016/j.apsusc.2013.08.115
通讯作者: Shang, P. (shangpeng163@163.com)
文章类型: 期刊论文
中文摘要: In this paper, tantalum pentoxide (Ta2O5), titanium dioxide (TiO2) and aluminum oxide (Al2O3) coatings are deposited on silicon substrates by ion beam sputtering (IBS). The influences of the thermal exposure at high temperature in air on the surface morphology, roughness, and the structure were investigated. The results indicate that the chemical composition of the as-deposited TiO2 and Ta 2O5 coatings are apparently close to the stoichiometry ratios and both of them are amorphous structures. The peaks corresponding to anatase TiO2 appear at 400 C while the anatase-to-rutile transformation is not observed after 800 C and 1000 C bake. Ta2O 5 coating crystallizes at 800 C and 1000 C to form the hexagonal structure and orthorhombic structure, respectively. TiO2 and Al 2O3 single layers all develop catastrophic damage at 400 C in the form of noted spallation or blisters, whereas there is no visible damage for the Ta2O5 coating even at 1000 C. To understand possible damage mechanisms, the thermal stress distributions through the thickness of Ta2O5 and TiO2 coatings and the influence of the microstructure transformation are discussed. Finally, some possible approaches to improve the thermal stability are also proposed. © 2013 Elsevier B.V. All rights reserved.
英文摘要: In this paper, tantalum pentoxide (Ta2O5), titanium dioxide (TiO2) and aluminum oxide (Al2O3) coatings are deposited on silicon substrates by ion beam sputtering (IBS). The influences of the thermal exposure at high temperature in air on the surface morphology, roughness, and the structure were investigated. The results indicate that the chemical composition of the as-deposited TiO2 and Ta 2O5 coatings are apparently close to the stoichiometry ratios and both of them are amorphous structures. The peaks corresponding to anatase TiO2 appear at 400 C while the anatase-to-rutile transformation is not observed after 800 C and 1000 C bake. Ta2O 5 coating crystallizes at 800 C and 1000 C to form the hexagonal structure and orthorhombic structure, respectively. TiO2 and Al 2O3 single layers all develop catastrophic damage at 400 C in the form of noted spallation or blisters, whereas there is no visible damage for the Ta2O5 coating even at 1000 C. To understand possible damage mechanisms, the thermal stress distributions through the thickness of Ta2O5 and TiO2 coatings and the influence of the microstructure transformation are discussed. Finally, some possible approaches to improve the thermal stability are also proposed. © 2013 Elsevier B.V. All rights reserved.
收录类别: SCI ; Ei
语种: 英语
WOS记录号: WOS:000326579400084
ISSN号: 01694332
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/6621
Appears in Collections:薄膜光学技术研究室(十一室)_期刊论文

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作者单位: 1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. Graduate School of the Chinese Academy of Sciences, Beijing 100039, China

Recommended Citation:
Shang, Peng,Xiong, Shengming,Li, Linghui,et al. Investigation on thermal stability of Ta2O5, TiO 2 and Al2O3 coatings for application at high temperature[J]. Applied Surface Science,2013,285(PARTB):713-720.
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