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题名:
Repetition rate dependence of absorption of fused silica irradiated at 193 nm
作者: Liu, Weijing1,2; Li, Bincheng1
刊名: Chinese Optics Letters
出版日期: 2013
卷号: 11, 期号:5, 页码:053002
学科分类: Two photon processes
DOI: 10.3788/COL201311.053002
通讯作者: Li, B. (bcli@ioe.ac.cn)
文章类型: 期刊论文
中文摘要: Repetition rate-dependent absorbance measurements of synthetic fused silica at 193-nm irradiation are performed in the range of 50-1 000 Hz with an ArF laser calorimeter. The "apparent" single- and twophoton absorption coefficients are determined by measuring the laser fluence-dependent absorbance of fused silica samples with different thicknesses to separate the surface absorption and bulk absorption. The measurement results indicate a reversible nonlinear increase of both apparent single- and two-photon absorption coefficients with increasing repetition rate for the synthetic fused silica, whereas the surface absorption shows no dependence on the repetition rate. © 2013 Chinese Optics Letters.
英文摘要: Repetition rate-dependent absorbance measurements of synthetic fused silica at 193-nm irradiation are performed in the range of 50-1 000 Hz with an ArF laser calorimeter. The "apparent" single- and twophoton absorption coefficients are determined by measuring the laser fluence-dependent absorbance of fused silica samples with different thicknesses to separate the surface absorption and bulk absorption. The measurement results indicate a reversible nonlinear increase of both apparent single- and two-photon absorption coefficients with increasing repetition rate for the synthetic fused silica, whereas the surface absorption shows no dependence on the repetition rate. © 2013 Chinese Optics Letters.
收录类别: SCI ; Ei
语种: 英语
WOS记录号: WOS:000321226100019
ISSN号: 16717694
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/6615
Appears in Collections:薄膜光学技术研究室(十一室)_期刊论文

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作者单位: 1. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2. University of Chinese Academy of Sciences, Beijing 100049, China

Recommended Citation:
Liu, Weijing,Li, Bincheng. Repetition rate dependence of absorption of fused silica irradiated at 193 nm[J]. Chinese Optics Letters,2013,11(5):053002.
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