IOE OpenIR  > 薄膜光学技术研究室(十一室)
3.6m大口径镀膜机膜厚均匀性分析
艾万君; 熊胜明
Source Publication光电工程
Volume38Issue:11Pages:78-83
2011
Language中文
Subtype期刊论文
Abstract分别建立了旋转平面与球面夹具配置下的薄膜膜厚均匀性理论计算模型,对3.6m大口径镀膜机下直径为2.6m基板的膜厚均匀性进行了研究。为了改善膜厚均匀性,分别采用两个蒸发源和三个蒸发源进行蒸镀。薄膜的膜厚不均匀性通过理论计算模型进行优化计算得到。对于两个蒸发源,分别得到了两旋转夹具配置下的最优几何配置,对应的膜厚不均匀性最小值分别为7.62%和5.58%。对于三个蒸发源,也分别得到了两旋转夹具配置下的最优几何配置,对应的膜厚不均匀性最小值分别为5.79%和3.48%。结果表明:采用三个蒸发源能更好的改善膜厚分布,而且旋转球面夹具配置下得到的膜厚均匀性整体上较好。
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/6593
Collection薄膜光学技术研究室(十一室)
Corresponding Author艾万君
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
艾万君,熊胜明. 3.6m大口径镀膜机膜厚均匀性分析[J]. 光电工程,2011,38(11):78-83.
APA 艾万君,&熊胜明.(2011).3.6m大口径镀膜机膜厚均匀性分析.光电工程,38(11),78-83.
MLA 艾万君,et al."3.6m大口径镀膜机膜厚均匀性分析".光电工程 38.11(2011):78-83.
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2011-11-001.pdf(480KB)期刊论文作者接受稿开放获取CC BY-NC-SAApplication Full Text
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