| IR variable angle spectroscopic ellipsometry study of high dose ion-implanted and annealed silicon wafers | |
| Liu Xianming; Li Bincheng | |
| Source Publication | Journal of Applied Physics
 |
| Volume | 105Issue:1Pages:13533 |
| 2009 | |
| Language | 英语 |
| Indexed By | SCI ; Ei |
| Subtype | 期刊论文 |
| Abstract | We employed Fourier transform variable angle infrared spectroscopic ellipsometry (IRSE) in wavelength range of 2-30 mu m to investigate a group of silicon wafers, which are implanted with high doses and annealed in high temperature. The IRSE spectra for samples with different implantation doses were analyzed physically. When the semiconductor is heavily doped, it becomes degenerated and the doped impurities cannot ionize completely. For the analysis of the IRSE data, we quantitated the ionization probability as a function of impurity concentration in the optical model to describe the carrier concentration profile, by which the impurity concentration and carrier concentration profiles can be determined simultaneously. (C) 2009 American Institute of Physics.; We employed Fourier transform variable angle infrared spectroscopic ellipsometry (IRSE) in wavelength range of 2-30 mu m to investigate a group of silicon wafers, which are implanted with high doses and annealed in high temperature. The IRSE spectra for samples with different implantation doses were analyzed physically. When the semiconductor is heavily doped, it becomes degenerated and the doped impurities cannot ionize completely. For the analysis of the IRSE data, we quantitated the ionization probability as a function of impurity concentration in the optical model to describe the carrier concentration profile, by which the impurity concentration and carrier concentration profiles can be determined simultaneously. (C) 2009 American Institute of Physics. |
| Document Type | 期刊论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/6566 |
| Collection | 薄膜光学技术研究室（十一室） |
| Corresponding Author | Liu Xianming |
| Affiliation | 中国科学院光电技术研究所 |
| Recommended Citation GB/T 7714 | Liu Xianming,Li Bincheng. IR variable angle spectroscopic ellipsometry study of high dose ion-implanted and annealed silicon wafers[J]. Journal of Applied Physics,2009,105(1):13533. |
| APA | Liu Xianming,&Li Bincheng.(2009).IR variable angle spectroscopic ellipsometry study of high dose ion-implanted and annealed silicon wafers.Journal of Applied Physics,105(1),13533. |
| MLA | Liu Xianming,et al."IR variable angle spectroscopic ellipsometry study of high dose ion-implanted and annealed silicon wafers".Journal of Applied Physics 105.1(2009):13533. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| 2009-208.pdf（352KB） | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | View Application Full Text | |
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