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题名:
Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review
作者: Wang, Changtao; Zhang, Wei; Zhao, Zeyu; Wang, Yanqin; Gao, Ping; Luo, Yunfei; Luo, Xiangang
刊名: MICROMACHINES
出版日期: 2016-07-01
卷号: 7, 期号:7
关键词: surface plasmon polaritons ; bulk plasmon polaritons ; diffraction limit ; subwavelength optics ; near-field optics ; metamaterial ; super resolution ; nano optical lithography ; nanostructure fabrication
DOI: 10.3390/mi7070118
文章类型: Review
英文摘要: The rapid development of nanotechnologies and sciences has led to the great demand for novel lithography methods allowing large area, low cost and high resolution nano fabrications. Characterized by unique sub-diffraction optical features like propagation with an ultra-short wavelength and great field enhancement in subwavelength regions, surface plasmon polaritons (SPPs), including surface plasmon waves, bulk plasmon polaritons (BPPs) and localized surface plasmons (LSPs), have become potentially promising candidates for nano lithography. In this paper, investigations into plasmonic lithography in the manner of point-to-point writing, interference and imaging were reviewed in detail. Theoretical simulations and experiments have demonstrated plasmonic lithography resolution far beyond the conventional diffraction limit, even with ultraviolet light sources and single exposure performances. Half-pitch resolution as high as 22 nm (similar to 1/17 light wavelength) was observed in plasmonic lens imaging lithography. Moreover, not only the overview of state-of-the-art results, but also the physics behind them and future research suggestions are discussed as well.
WOS标题词: Science & Technology ; Technology
类目[WOS]: Nanoscience & Nanotechnology ; Instruments & Instrumentation
研究领域[WOS]: Science & Technology - Other Topics ; Instruments & Instrumentation
关键词[WOS]: CIRCULAR-POLARIZATION ANALYZER ; OFF-AXIS ILLUMINATION ; PLANAR ANISOTROPIC METAMATERIALS ; HIGH-ASPECT-RATIO ; NEAR-FIELD ; INTERFERENCE LITHOGRAPHY ; NEGATIVE REFRACTION ; SURFACE-PLASMONS ; SUPERLENS LITHOGRAPHY ; VISIBLE FREQUENCIES
收录类别: SCI
项目资助者: 973 Program of China(2013CBA01700) ; National Natural Science Funds(61138002 ; 61575204)
语种: 英语
WOS记录号: WOS:000380770000013
ISSN号: 2072-666X
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/6472
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, Chengdu 610209, Peoples R China

Recommended Citation:
Wang, Changtao,Zhang, Wei,Zhao, Zeyu,et al. Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review[J]. MICROMACHINES,2016,7(7).
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