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题名:
Nanolithography method by using localized surface plasmon mask generated with polydimethylsiloxane soft mold on thin metal film
作者: Yukun Zhang; Xiaochun Dong; Jinglei Du; Xingzhan Wei; Lifang Shi; Qiling Deng; Chunlei Du
刊名: Optics Letters
出版日期: 2010
卷号: 35, 期号:13, 页码:2143-2145
通讯作者: Yukun Zhang
文章类型: 期刊论文
中文摘要: We propose a photolithographic method to fabricate nanostructures by employing a localized surface plasmon (LSP) mask generated by a soft mold on a thin metal film. The soft mold can be formed by transparent materials, such as polydimethylsiloxane, contacting firmly to the metal film. The pattern edges of the mold, serving as the fine tapers, can be used to excite LSPs and accumulate a large amount of localized energy from the incident light field, providing a modulated optical field in the resist with nanometer feature size. Nanolithographic results with a minimum feature size of 30 nm are demonstrated.
英文摘要: We propose a photolithographic method to fabricate nanostructures by employing a localized surface plasmon (LSP) mask generated by a soft mold on a thin metal film. The soft mold can be formed by transparent materials, such as polydimethylsiloxane, contacting firmly to the metal film. The pattern edges of the mold, serving as the fine tapers, can be used to excite LSPs and accumulate a large amount of localized energy from the incident light field, providing a modulated optical field in the resist with nanometer feature size. Nanolithographic results with a minimum feature size of 30 nm are demonstrated.
语种: 英语
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/4972
Appears in Collections:微电子装备总体研究室(四室微光学) _期刊论文

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作者单位: 中国科学院光电技术研究所

Recommended Citation:
Yukun Zhang,Xiaochun Dong,Jinglei Du,et al. Nanolithography method by using localized surface plasmon mask generated with polydimethylsiloxane soft mold on thin metal film[J]. Optics Letters,2010,35(13):2143-2145.
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