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题名:
Concept and modeling analysis of a high fidelity multimode deformable mirror
作者: Zhou, Chao; Li, Yun; Wang, Anding; Xing, Tingwen
刊名: APPLIED OPTICS
出版日期: 2015
卷号: 54, 期号:17, 页码:5436-5443
学科分类: ADAPTIVE OPTICS; LOW-COST; LITHOGRAPHY; PERFORMANCE; UNIMORPH; MODES
DOI: 10.1364/AO.54.005436
文章类型: 期刊论文
中文摘要: Conventional deformable mirrors (DM) cannot meet the requirement of aberration controlling for advanced lithography tools. This paper illustrates an approach using the property that deformation of a thin plate is similar to optical modes to realize a high fidelity multimode deformable mirror whose deformation has characteristics of optical aberration modes. The way to arrange actuators is also examined. In this paper, a 36-actuator deformable mirror is taken as an example to generate low-order Zernike modes. The result shows that this DM generates the fourth fringe Zernike mode (Z4) defocus, and primary aberration Z5-Z8 with an error less than 0.5%, generates the fifth-order aberration Z10-Z14, and generates the seventh-order aberration Z17-Z20 with an error less than 1.1%. The high fidelity replication of the Zernike mode indicates that the DM satisfies the demand of controlling aberrations corresponding to the first 20 Zernike modes in an advanced lithography tool. (C) 2015 Optical Society of America
英文摘要: Conventional deformable mirrors (DM) cannot meet the requirement of aberration controlling for advanced lithography tools. This paper illustrates an approach using the property that deformation of a thin plate is similar to optical modes to realize a high fidelity multimode deformable mirror whose deformation has characteristics of optical aberration modes. The way to arrange actuators is also examined. In this paper, a 36-actuator deformable mirror is taken as an example to generate low-order Zernike modes. The result shows that this DM generates the fourth fringe Zernike mode (Z4) defocus, and primary aberration Z5-Z8 with an error less than 0.5%, generates the fifth-order aberration Z10-Z14, and generates the seventh-order aberration Z17-Z20 with an error less than 1.1%. The high fidelity replication of the Zernike mode indicates that the DM satisfies the demand of controlling aberrations corresponding to the first 20 Zernike modes in an advanced lithography tool. (C) 2015 Optical Society of America
收录类别: SCI
项目资助者: Institute of Optical and Electric, Chinese Academy of Science
语种: 英语
WOS记录号: WOS:000356101200023
ISSN号: 1559-128X
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内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/4263
Appears in Collections:应用光学研究室(二室)_期刊论文

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Recommended Citation:
Zhou, Chao,Li, Yun,Wang, Anding,et al. Concept and modeling analysis of a high fidelity multimode deformable mirror[J]. APPLIED OPTICS,2015,54(17):5436-5443.
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