题名: Spherical aberrations and manufacturing errors in eliminating the substrate errors of a computer-generated hologram
作者: Feng, Jie 1,2 ; Deng, Chao 1 ; Xing, Tingwen 1
刊名: Optical Engineering
出版日期: 2013
卷号: 52, 期号: 9, 页码: 091723 学科分类: Aberrations - Computer generated holography - Diffraction - Electron holography - Holograms - Manufacture - Measurement errors - Wavefronts
DOI: 10.1117/1.OE.52.9.091723
文章类型: 期刊论文
中文摘要: Computer-generated holograms (CGH) are widely used in optical testing. CGH fabrication errors caused by the CGH manufacturing processes can lead to errors in the diffraction wavefront. CGH substrate errors affect the testing accuracy significantly among the CGH fabrication errors. An experimental method is discussed for measuring CGH substrate errors. There are two problems in this method: (1) zero-order diffraction light introduces spherical aberrations during the measurement of substrate errors; (2) CGH manufacturing errors introduced by nonuniformities in duty-cycle, etching depth, amplitude affect zero, and nonzero orders differently. These problems are analyzed to optimize the CGH design as well as to achieve better diffraction efficiency and low sensitivity to manufacturing errors. © 2013 Society of Photo-Optical Instrumentation Engineers (SPIE). 英文摘要: Computer-generated holograms (CGH) are widely used in optical testing. CGH fabrication errors caused by the CGH manufacturing processes can lead to errors in the diffraction wavefront. CGH substrate errors affect the testing accuracy significantly among the CGH fabrication errors. An experimental method is discussed for measuring CGH substrate errors. There are two problems in this method: (1) zero-order diffraction light introduces spherical aberrations during the measurement of substrate errors; (2) CGH manufacturing errors introduced by nonuniformities in duty-cycle, etching depth, amplitude affect zero, and nonzero orders differently. These problems are analyzed to optimize the CGH design as well as to achieve better diffraction efficiency and low sensitivity to manufacturing errors. © 2013 Society of Photo-Optical Instrumentation Engineers (SPIE). 收录类别: Ei
语种: 英语
ISSN号: 00913286
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内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/4251
Appears in Collections: 应用光学研究室（二室）_期刊论文
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作者单位: 1. Chinese Academy of Sciences, Institute of Optics and Electronics, Laboratory of Applied Optics, Chengdu 610209, China
Recommended Citation:
Feng, Jie,Deng, Chao,Xing, Tingwen. Spherical aberrations and manufacturing errors in eliminating the substrate errors of a computer-generated hologram[J]. Optical Engineering,2013,52(9):091723.
