中国科学院光电技术研究所机构知识库
Advanced  
IOE OpenIR  > 应用光学研究室(二室)  > 期刊论文
题名:
Spherical aberrations and manufacturing errors in eliminating the substrate errors of a computer-generated hologram
作者: Feng, Jie1,2; Deng, Chao1; Xing, Tingwen1
刊名: Optical Engineering
出版日期: 2013
卷号: 52, 期号:9, 页码:091723
学科分类: Aberrations - Computer generated holography - Diffraction - Electron holography - Holograms - Manufacture - Measurement errors - Wavefronts
DOI: 10.1117/1.OE.52.9.091723
文章类型: 期刊论文
中文摘要: Computer-generated holograms (CGH) are widely used in optical testing. CGH fabrication errors caused by the CGH manufacturing processes can lead to errors in the diffraction wavefront. CGH substrate errors affect the testing accuracy significantly among the CGH fabrication errors. An experimental method is discussed for measuring CGH substrate errors. There are two problems in this method: (1) zero-order diffraction light introduces spherical aberrations during the measurement of substrate errors; (2) CGH manufacturing errors introduced by nonuniformities in duty-cycle, etching depth, amplitude affect zero, and nonzero orders differently. These problems are analyzed to optimize the CGH design as well as to achieve better diffraction efficiency and low sensitivity to manufacturing errors. © 2013 Society of Photo-Optical Instrumentation Engineers (SPIE).
英文摘要: Computer-generated holograms (CGH) are widely used in optical testing. CGH fabrication errors caused by the CGH manufacturing processes can lead to errors in the diffraction wavefront. CGH substrate errors affect the testing accuracy significantly among the CGH fabrication errors. An experimental method is discussed for measuring CGH substrate errors. There are two problems in this method: (1) zero-order diffraction light introduces spherical aberrations during the measurement of substrate errors; (2) CGH manufacturing errors introduced by nonuniformities in duty-cycle, etching depth, amplitude affect zero, and nonzero orders differently. These problems are analyzed to optimize the CGH design as well as to achieve better diffraction efficiency and low sensitivity to manufacturing errors. © 2013 Society of Photo-Optical Instrumentation Engineers (SPIE).
收录类别: Ei
语种: 英语
ISSN号: 00913286
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/4251
Appears in Collections:应用光学研究室(二室)_期刊论文

Files in This Item:
File Name/ File Size Content Type Version Access License
2013-2090.pdf(527KB)期刊论文作者接受稿开放获取View 联系获取全文

作者单位: 1. Chinese Academy of Sciences, Institute of Optics and Electronics, Laboratory of Applied Optics, Chengdu 610209, China
2. University of Chinese Academy of Sciences, Beijing 100049, China

Recommended Citation:
Feng, Jie,Deng, Chao,Xing, Tingwen. Spherical aberrations and manufacturing errors in eliminating the substrate errors of a computer-generated hologram[J]. Optical Engineering,2013,52(9):091723.
Service
Recommend this item
Sava as my favorate item
Show this item's statistics
Export Endnote File
Google Scholar
Similar articles in Google Scholar
[Feng, Jie]'s Articles
[Deng, Chao]'s Articles
[Xing, Tingwen]'s Articles
CSDL cross search
Similar articles in CSDL Cross Search
[Feng, Jie]‘s Articles
[Deng, Chao]‘s Articles
[Xing, Tingwen]‘s Articles
Related Copyright Policies
Null
Social Bookmarking
Add to CiteULike Add to Connotea Add to Del.icio.us Add to Digg Add to Reddit
文件名: 2013-2090.pdf
格式: Adobe PDF
所有评论 (0)
暂无评论
 
评注功能仅针对注册用户开放,请您登录
您对该条目有什么异议,请填写以下表单,管理员会尽快联系您。
内 容:
Email:  *
单位:
验证码:   刷新
您在IR的使用过程中有什么好的想法或者建议可以反馈给我们。
标 题:
 *
内 容:
Email:  *
验证码:   刷新

Items in IR are protected by copyright, with all rights reserved, unless otherwise indicated.

 

 

Valid XHTML 1.0!
Copyright © 2007-2016  中国科学院光电技术研究所 - Feedback
Powered by CSpace