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193nm移相点衍射干涉仪的测量误差分析
邢廷文; 何国良; 舒亮
Source Publication光电工程
Volume36Issue:2Pages:67-72
2009
Language中文
Subtype期刊论文
Abstract为了提高移相点衍射干涉仪对193 nm投影光刻系统的检测精度,本文对其主要测量误差进行了探讨.在简要介绍了193 nm移相点衍射干涉仪的基本结构和测量原理之后,总结了可能对测量结果产生影响的各种误差及其产生的原因.通过
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/4207
Collection应用光学研究室(二室)
Corresponding Author邢廷文
Affiliation中国科学院光电技术研究所
Recommended Citation
GB/T 7714
邢廷文,何国良,舒亮. 193nm移相点衍射干涉仪的测量误差分析[J]. 光电工程,2009,36(2):67-72.
APA 邢廷文,何国良,&舒亮.(2009).193nm移相点衍射干涉仪的测量误差分析.光电工程,36(2),67-72.
MLA 邢廷文,et al."193nm移相点衍射干涉仪的测量误差分析".光电工程 36.2(2009):67-72.
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