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Effect of Near-Field Diffraction in Photolithography of Hexagonal Arrays for Dichroic Filters
Zhou, Shaolin1; Liu, Junbo2; Deng, Qian2; Xie, Changqing3; Chan, Mansun4
Source PublicationIEEE PHOTONICS JOURNAL
Volume8Issue:4
2016-08-01
Language英语
ISSN1943-0655
DOI10.1109/JPHOT.2016.2594032
Indexed BySCI
WOS IDWOS:000381489500022
SubtypeArticle
AbstractDichroic filters with the hexagonal lattice of circular holes are used as fundamental devices for frequency selection from the infrared to the terahertz (THz) region. In the fabrication of such a high-density periodic array by the contact-mode photolithography, the depth of focus (DOF) turns out to be tremendously shrunk for ideal pattern contrast. In this paper, near-field diffraction of the hexagonal lattice was analytically treated, and the tolerant DOF was estimated in terms of the Talbot distance in photolithography. Affine transformation was applied to the rectangular lattice to derive the near-field diffraction intensity, and a process factor k(2) was introduced to predetermine the practical DOF in photolithography. Numerical calculations according to the analytic predication agree well with the preliminary experiments, where the intensity evolved drastically to suppress the limited DOF zone. It was also revealed that the practical DOF can be improved by eliminating the high-order diffraction or using the photoresist with higher threshold energy to enhance the process factor. The analytic and experimental results can be used to optimize the high-contrast patterning by optical lithography.
KeywordDiffraction Photolithography Terahertz Filters Hexagonal Array
WOS KeywordTIME-DOMAIN SPECTROSCOPY ; TERAHERTZ SPECTROSCOPY ; SECURITY APPLICATIONS ; BANDPASS-FILTERS ; LITHOGRAPHY ; WAVELENGTHS ; FABRICATION ; SPECTRUM ; LIGHT
WOS Research AreaEngineering ; Optics ; Physics
WOS SubjectEngineering, Electrical & Electronic ; Optics ; Physics, Applied
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/3921
Collection光电技术研究所被WoS收录文章
Affiliation1.South China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510640, Guangdong, Peoples R China
2.Chinese Acad Sci, State Key Lab Opt Technol Microfabricat, Inst Opt & Elect, Chengdu 610209, Peoples R China
3.Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China
4.Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Kowloon, Hong Kong, Peoples R China
Recommended Citation
GB/T 7714
Zhou, Shaolin,Liu, Junbo,Deng, Qian,et al. Effect of Near-Field Diffraction in Photolithography of Hexagonal Arrays for Dichroic Filters[J]. IEEE PHOTONICS JOURNAL,2016,8(4).
APA Zhou, Shaolin,Liu, Junbo,Deng, Qian,Xie, Changqing,&Chan, Mansun.(2016).Effect of Near-Field Diffraction in Photolithography of Hexagonal Arrays for Dichroic Filters.IEEE PHOTONICS JOURNAL,8(4).
MLA Zhou, Shaolin,et al."Effect of Near-Field Diffraction in Photolithography of Hexagonal Arrays for Dichroic Filters".IEEE PHOTONICS JOURNAL 8.4(2016).
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