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题名:
Effect of Near-Field Diffraction in Photolithography of Hexagonal Arrays for Dichroic Filters
作者: Zhou, Shaolin1; Liu, Junbo2; Deng, Qian2; Xie, Changqing3; Chan, Mansun4
刊名: IEEE PHOTONICS JOURNAL
出版日期: 2016-08-01
卷号: 8, 期号:4
关键词: Diffraction ; photolithography ; terahertz filters ; hexagonal array
DOI: 10.1109/JPHOT.2016.2594032
文章类型: Article
英文摘要: Dichroic filters with the hexagonal lattice of circular holes are used as fundamental devices for frequency selection from the infrared to the terahertz (THz) region. In the fabrication of such a high-density periodic array by the contact-mode photolithography, the depth of focus (DOF) turns out to be tremendously shrunk for ideal pattern contrast. In this paper, near-field diffraction of the hexagonal lattice was analytically treated, and the tolerant DOF was estimated in terms of the Talbot distance in photolithography. Affine transformation was applied to the rectangular lattice to derive the near-field diffraction intensity, and a process factor k(2) was introduced to predetermine the practical DOF in photolithography. Numerical calculations according to the analytic predication agree well with the preliminary experiments, where the intensity evolved drastically to suppress the limited DOF zone. It was also revealed that the practical DOF can be improved by eliminating the high-order diffraction or using the photoresist with higher threshold energy to enhance the process factor. The analytic and experimental results can be used to optimize the high-contrast patterning by optical lithography.
WOS标题词: Science & Technology ; Technology ; Physical Sciences
类目[WOS]: Engineering, Electrical & Electronic ; Optics ; Physics, Applied
研究领域[WOS]: Engineering ; Optics ; Physics
关键词[WOS]: TIME-DOMAIN SPECTROSCOPY ; TERAHERTZ SPECTROSCOPY ; SECURITY APPLICATIONS ; BANDPASS-FILTERS ; LITHOGRAPHY ; WAVELENGTHS ; FABRICATION ; SPECTRUM ; LIGHT
收录类别: SCI
项目资助者: National Natural Science Foundation of China (NSFC)(61405060 ; Guangdong Science and Technology Planning Project of Province(2014A010104005) ; Fundamental Research Funds for the Central Universities of South China University of Technology(2015 ZZ030) ; Opening Project of State Key Laboratory of Polymer Materials Engineering (Sichuan University)(Sklpeme-2015-4-28) ; 61307063)
语种: 英语
WOS记录号: WOS:000381489500022
ISSN号: 1943-0655
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3921
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.South China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510640, Guangdong, Peoples R China
2.Chinese Acad Sci, State Key Lab Opt Technol Microfabricat, Inst Opt & Elect, Chengdu 610209, Peoples R China
3.Chinese Acad Sci, Inst Microelect, Key Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China
4.Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Kowloon, Hong Kong, Peoples R China

Recommended Citation:
Zhou, Shaolin,Liu, Junbo,Deng, Qian,et al. Effect of Near-Field Diffraction in Photolithography of Hexagonal Arrays for Dichroic Filters[J]. IEEE PHOTONICS JOURNAL,2016,8(4).
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