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题名:
Large area and deep sub-wavelength interference lithography employing odd surface plasmon modes
作者: Liu, Liqin; Luo, Yunfei; Zhao, Zeyu; Zhang, Wei; Gao, Guohan; Zeng, Bo; Wang, Changtao; Luo, Xiangang
刊名: Scientific Reports
出版日期: 2016-07-28
卷号: 6
DOI: 10.1038/srep30450
文章类型: Article
英文摘要: In this paper, large area and deep sub-wavelength interference patterns are realized experimentally by using odd surface plasmon modes in the metal/insulator/metal structure. Theoretical investigation shows that the odd modes possesses much higher transversal wave vector and great inhibition of tangential electric field components, facilitating surface plasmon interference fringes with high resolution and contrast in the measure of electric field intensity. Interference resist patterns with 45 nm (similar to lambda/8) half-pitch, 50 nm depth, and area size up to 20 mm x 20 mm were obtained by using 20 nm Al/50 nm photo resist/50 nm Al films with greatly reduced surface roughness and 180 nm pitch exciting grating fabricated with conventional laser interference lithography. Much deeper resolution down to 19.5 nm is also feasible by decreasing the thickness of PR. Considering that no requirement of expensive EBL or FIB tools are employed, it provides a cost-effective way for large area and nano-scale fabrication.
WOS标题词: Science & Technology
类目[WOS]: Multidisciplinary Sciences
研究领域[WOS]: Science & Technology - Other Topics
关键词[WOS]: LASER INTERFERENCE ; NANOLITHOGRAPHY ; FILMS ; PHOTOLITHOGRAPHY ; FABRICATION ; RESOLUTION
收录类别: SCI
项目资助者: 973 Program of China(2013CBA01700) ; National Natural Science Foundation of China(61138002 ; 61177013)
语种: 英语
WOS记录号: WOS:000380725300001
ISSN号: 2045-2322
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3918
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: Chinese Acad Sci, State Key Lab Opt Technol Nanofabricat & Microeng, Inst Opt & Elect, POB 350, Chengdu 610209, Peoples R China

Recommended Citation:
Liu, Liqin,Luo, Yunfei,Zhao, Zeyu,et al. Large area and deep sub-wavelength interference lithography employing odd surface plasmon modes[J]. Scientific Reports,2016,6.
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