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IOE OpenIR  > 光电技术研究所被WoS收录文章  > 期刊论文
题名:
Dual-Channel Light Intensity Modulation Method for Focusing in Projection Lithography
作者: Li, Yanli; Yan, Wei; Hu, Song; Feng, JinHua; Wang, Jian
刊名: IEEE PHOTONICS JOURNAL
出版日期: 2016-02-01
卷号: 8, 期号:1
关键词: Focusing ; gratings ; lithography ; fringe analysis
DOI: 10.1109/JPHOT.2015.2508419
文章类型: Article
英文摘要: Focusing technique is the key factor in improving the resolution of projection lithography. In order to achieve high accuracy of focusing on the nanometer level, we present a focusing method based on dual-channel light intensity modulation. Two superposed grating fringes are formed with a phase difference of pi/2. The shift of the wafer can be resolved by the phase variation of corresponding fringes. The conventional focusing method with light intensity modulation is influenced by disturbing effects such as fluctuations of the light intensity and stray light. These adverse factors are overcome by the signal ratio of two channels with the same optical components. The focusing accuracy in our experiments is +/- 8 nm.
WOS标题词: Science & Technology ; Technology ; Physical Sciences
类目[WOS]: Engineering, Electrical & Electronic ; Optics ; Physics, Applied
研究领域[WOS]: Engineering ; Optics ; Physics
关键词[WOS]: GRATINGS
收录类别: SCI
项目资助者: National Natural Science Foundation of China(61274108 ; 61204114 ; 61376110)
语种: 英语
WOS记录号: WOS:000367824400005
ISSN号: 1943-0655
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3828
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China

Recommended Citation:
Li, Yanli,Yan, Wei,Hu, Song,et al. Dual-Channel Light Intensity Modulation Method for Focusing in Projection Lithography[J]. IEEE PHOTONICS JOURNAL,2016,8(1).
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