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题名:
Influence of sphere-surface distance and exposure dose on resolution of sphere-lens-array lithography
作者: Liu, Xianchao1,2,3; Li, Xiong3; Li, Ling1,2; Chen, Weidong1,2; Luo, Xiangang3
刊名: OPTICS EXPRESS
出版日期: 2015-11-16
卷号: 23, 期号:23, 页码:30136-30142
DOI: 10.1364/OE.23.030136
文章类型: Article
英文摘要: Sphere-surface distance and exposure dose effects on lithography resolution of microsphere lens array are studied. A transparent gap is introduced between photoresist film and polystyrene microspheres to adjust light distribution of photoresist surface. The pores size on the photoresist film varies when the gap thickness is changed. By optimization gap thickness and exposure dose, sub-100 nm surface patterning array is achieved for sphere of 2.06 mu m diameter and optical wavelength. of 400 nm theoretically and experimentally. Furthermore, when smaller polystyrene sphere (1.25 mu m diameter) is chosen, spot width of 35 nm is realized by numerical calculation. This nano-fabrication method is simple, low-cost and high-efficiency, which can provide opportunities to make a variety of nano-devices, such as biosensors and nano-antennas. (C) 2015 Optical Society of America
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: FEMTOSECOND LASER ; PHOTONIC NANOJETS ; DIRECT-WRITE ; NANOLITHOGRAPHY ; PARTICLE ; PHOTOLITHOGRAPHY ; MICROSPHERES ; MICROSCOPY
收录类别: SCI
项目资助者: 973 Program of China(2013CBA01700) ; National Natural Science Foundation of China(61138002 ; 61307043)
语种: 英语
WOS记录号: WOS:000366611500080
ISSN号: 1094-4087
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3777
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Sichuan Normal Univ, Inst Solid State Phys, Chengdu 610066, Peoples R China
2.Sichuan Normal Univ, Dept Phys, Chengdu 610066, Peoples R China
3.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, Chengdu 610209, Peoples R China

Recommended Citation:
Liu, Xianchao,Li, Xiong,Li, Ling,et al. Influence of sphere-surface distance and exposure dose on resolution of sphere-lens-array lithography[J]. OPTICS EXPRESS,2015,23(23):30136-30142.
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