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题名:
Fabrication of hybrid soft-nanoimprint mold in benign ambient based on thiol-ene
作者: Zhang, Man; Cao, Axiu; Shi, Lifang; Deng, Qiling; Hu, Song
刊名: OPTIK
出版日期: 2015
卷号: 126, 期号:23, 页码:4123-4126
关键词: Soft-nanoimprint lithography ; Hybrid mold ; Thiol-ene ; PDMS
DOI: 10.1016/j.ijleo.2015.08.030
文章类型: Article
英文摘要: Soft-nanoimprint lithography is a high-throughput and cost-effective lithographic technique with high resolution and low pressure, of which the crucial component is the mold. We demonstrate a method to fabricate hybrid soft-nanoimprint mold in benign ambient based on UV-curable thiol-ene polymer. Because of the special photopolymerization mechanism via "click chemistry", thiol-ene can be cured completely at ambient conditions without inhabitation from oxygen or moisture. The mold can be fabricated in air not in vacuum or a nitrogen atmosphere to simplify the fabrication process and lower the cost. Based on this method, we fabricated a soft-nanoimprint hybrid mold in benign ambient, which is composed of rigid thiol-ene features with sub-60 nm resolution on an elastic poly(dimethylsiloxane) (PDMS) substrate. (C) 2015 Elsevier GmbH. All rights reserved.
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: IMPRINT LITHOGRAPHY ; CLICK CHEMISTRY ; POLY(DIMETHYLSILOXANE) ; RESOLUTION ; SURFACE
收录类别: SCI
项目资助者: National Nature Science Foundation of China(11174281 ; 61275061 ; 11074251)
语种: 英语
WOS记录号: WOS:000365373400125
ISSN号: 0030-4026
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3768
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China

Recommended Citation:
Zhang, Man,Cao, Axiu,Shi, Lifang,et al. Fabrication of hybrid soft-nanoimprint mold in benign ambient based on thiol-ene[J]. OPTIK,2015,126(23):4123-4126.
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