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题名:
Going far beyond the near-field diffraction limit via plasmonic cavity lens with high spatial frequency spectrum off-axis illumination
作者: Zhao, Zeyu; Luo, Yunfei; Zhang, Wei; Wang, Changtao; Gao, Ping; Wang, Yanqin; Pu, Mingbo; Yao, Na; Zhao, Chengwei; Luo, Xiangang
刊名: SCIENTIFIC REPORTS
出版日期: 2015-10-19
卷号: 5
DOI: 10.1038/srep15320
文章类型: Article
英文摘要: For near-field imaging optics, minimum resolvable feature size is highly constrained by the near-field diffraction limit associated with the illumination light wavelength and the air distance between the imaging devices and objects. In this study, a plasmonic cavity lens composed of Ag-photoresist-Ag form incorporating high spatial frequency spectrum off-axis illumination (OAI) is proposed to realize deep subwavelength imaging far beyond the near-field diffraction limit. This approach benefits from the resonance effect of the plasmonic cavity lens and the wavevector shifting behavior via OAI, which remarkably enhances the object's subwavelength information and damps negative imaging contribution from the longitudinal electric field component in imaging region. Experimental images of well resolved 60-nm half-pitch patterns under 365-nm ultra-violet light are demonstrated at air distance of 80 nm between the mask patterns and plasmonic cavity lens, approximately four-fold longer than that in the conventional near-field lithography and superlens scheme. The ultimate air distance for the 60-nm half-pitch object could be theoretically extended to 120 nm. Moreover, two-dimensional L-shape patterns and deep subwavelength patterns are illustrated via simulations and experiments. This study promises the significant potential to make plasmonic lithography as a practical, cost-effective, simple and parallel nano-fabrication approach.
WOS标题词: Science & Technology
类目[WOS]: Multidisciplinary Sciences
研究领域[WOS]: Science & Technology - Other Topics
关键词[WOS]: SCANNING INTERFEROMETER ; THICKNESS MEASUREMENT ; SILVER SUPERLENS ; LITHOGRAPHY ; RESOLUTION ; PHOTOLITHOGRAPHY ; EVANESCENT ; LIGHT ; FILM ; NANOLITHOGRAPHY
收录类别: SCI
语种: 英语
WOS记录号: WOS:000362988400001
ISSN号: 2045-2322
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3719
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: Chinese Acad Sci, State Key Lab Opt Technol Nanofabricat & Microeng, Inst Opt & Elect, Chengdu 610209, Peoples R China

Recommended Citation:
Zhao, Zeyu,Luo, Yunfei,Zhang, Wei,et al. Going far beyond the near-field diffraction limit via plasmonic cavity lens with high spatial frequency spectrum off-axis illumination[J]. SCIENTIFIC REPORTS,2015,5.
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