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题名:
Squeezing Bulk Plasmon Polaritons through Hyperbolic Metamaterials for Large Area Deep Subwavelength Interference Lithography
作者: Liang, Gaofeng1,2; Wang, Changtao1; Zhao, Zeyu1; Wang, Yanqin1; Yao, Na1; Gao, Ping1; Luo, Yunfei1; Gao, Guohan1; Zhao, Qing2; Luo, Xiangang1
刊名: ADVANCED OPTICAL MATERIALS
出版日期: 2015-09-01
卷号: 3, 期号:9, 页码:1248-1256
DOI: 10.1002/adom.201400596
文章类型: Article
英文摘要: Hyperbolic metamaterial composed of SiO2/Al films are explored to squeeze out bulk plasmon polaritons (BPPs) to produce large area and uniform deep subwavelength interference patterns. As examples, two and four BPPs interference lithography with half pitch 45 nm (approximate to lambda/8) are demonstrated in experiments. Much deeper resolution up to 22.5 nm (approximate to lambda/16) and variety of BPPs interference patterns are feasible. The period of grating structures for transferring photons to BPPs is much larger than that of BPPs interference patterns, facilitating the structures fabrication by simple and low cost methods like large area laser interference lithography. It is believed that the method provides a cost-effective, parallel, and large area nanofabrication way.
WOS标题词: Science & Technology ; Technology ; Physical Sciences
类目[WOS]: Materials Science, Multidisciplinary ; Optics
研究领域[WOS]: Materials Science ; Optics
关键词[WOS]: HOLOGRAPHIC LITHOGRAPHY ; PHOTONIC CRYSTALS ; SURFACE-PLASMONS ; NANOLITHOGRAPHY ; PHOTOLITHOGRAPHY ; TRANSMISSION ; DIFFRACTION ; FABRICATION ; ULTRAVIOLET ; REFLECTION
收录类别: SCI
语种: 英语
WOS记录号: WOS:000362524300014
ISSN号: 2195-1071
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3717
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Chinese Acad Sci, State Key Lab Opt Technol Nanofabricat & Microeng, Inst Opt & Elect, Chengdu 610209, Peoples R China
2.Univ Elect Sci & Technol China, Sch Phys Elect, Chengdu 610054, Peoples R China

Recommended Citation:
Liang, Gaofeng,Wang, Changtao,Zhao, Zeyu,et al. Squeezing Bulk Plasmon Polaritons through Hyperbolic Metamaterials for Large Area Deep Subwavelength Interference Lithography[J]. ADVANCED OPTICAL MATERIALS,2015,3(9):1248-1256.
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