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Spectrum-Integral Talbot Effect for UV Photolithography With Extended DOF
Liu, Junbo1,2; Zhou, Shaolin3; Hu, Song4; Gao, Hongtao4; He, Yu4; Cheng, Yiguang1,2
Source PublicationIEEE PHOTONICS TECHNOLOGY LETTERS
Volume27Issue:20Pages:2201-2204
2015-10-15
Language英语
ISSN1041-1135
DOI10.1109/LPT.2015.2456184
Indexed BySCI
WOS IDWOS:000361685200024
SubtypeArticle
AbstractA route of spectrum-integral Talbot lithography (SITL) with extended depth-of-focus (DOF) for microfabrication of periodic structures was explored under broadband incoherent illumination in this letter. The transmitted diffraction fields by different spectral components integrate together to generate the successive periodicity since certain distance along the direction of propagation. The mechanism of DOF extension was derived and numerically elucidated using the spectrum of a practical ultraviolet source. Experiments of proximity lithography in term of the numeric results were performed to record the intensity distributions within the DOF area. Finally, the results reveal the validity of SITL and its potentials in high-fidelity lithography of periodic micropatterns with almost unlimited DOF and thus enhanced resolution.
KeywordDiffraction Depth-of-focus Talbot Lithography Microfabrication
WOS KeywordINTERFERENCE LITHOGRAPHY ; HIGH-RESOLUTION ; GRATINGS ; ARRAYS
WOS Research AreaEngineering ; Optics ; Physics
WOS SubjectEngineering, Electrical & Electronic ; Optics ; Physics, Applied
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Cited Times:2[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/3710
Collection光电技术研究所被WoS收录文章
Affiliation1.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
2.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
3.S China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510640, Guangdong, Peoples R China
4.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
Recommended Citation
GB/T 7714
Liu, Junbo,Zhou, Shaolin,Hu, Song,et al. Spectrum-Integral Talbot Effect for UV Photolithography With Extended DOF[J]. IEEE PHOTONICS TECHNOLOGY LETTERS,2015,27(20):2201-2204.
APA Liu, Junbo,Zhou, Shaolin,Hu, Song,Gao, Hongtao,He, Yu,&Cheng, Yiguang.(2015).Spectrum-Integral Talbot Effect for UV Photolithography With Extended DOF.IEEE PHOTONICS TECHNOLOGY LETTERS,27(20),2201-2204.
MLA Liu, Junbo,et al."Spectrum-Integral Talbot Effect for UV Photolithography With Extended DOF".IEEE PHOTONICS TECHNOLOGY LETTERS 27.20(2015):2201-2204.
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