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题名:
Spectrum-Integral Talbot Effect for UV Photolithography With Extended DOF
作者: Liu, Junbo1,2; Zhou, Shaolin3; Hu, Song4; Gao, Hongtao4; He, Yu4; Cheng, Yiguang1,2
刊名: IEEE PHOTONICS TECHNOLOGY LETTERS
出版日期: 2015-10-15
卷号: 27, 期号:20, 页码:2201-2204
关键词: Diffraction ; depth-of-focus ; Talbot lithography ; microfabrication
DOI: 10.1109/LPT.2015.2456184
文章类型: Article
英文摘要: A route of spectrum-integral Talbot lithography (SITL) with extended depth-of-focus (DOF) for microfabrication of periodic structures was explored under broadband incoherent illumination in this letter. The transmitted diffraction fields by different spectral components integrate together to generate the successive periodicity since certain distance along the direction of propagation. The mechanism of DOF extension was derived and numerically elucidated using the spectrum of a practical ultraviolet source. Experiments of proximity lithography in term of the numeric results were performed to record the intensity distributions within the DOF area. Finally, the results reveal the validity of SITL and its potentials in high-fidelity lithography of periodic micropatterns with almost unlimited DOF and thus enhanced resolution.
WOS标题词: Science & Technology ; Technology ; Physical Sciences
类目[WOS]: Engineering, Electrical & Electronic ; Optics ; Physics, Applied
研究领域[WOS]: Engineering ; Optics ; Physics
关键词[WOS]: INTERFERENCE LITHOGRAPHY ; HIGH-RESOLUTION ; GRATINGS ; ARRAYS
收录类别: SCI
语种: 英语
WOS记录号: WOS:000361685200024
ISSN号: 1041-1135
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3710
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
2.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
3.S China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510640, Guangdong, Peoples R China
4.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China

Recommended Citation:
Liu, Junbo,Zhou, Shaolin,Hu, Song,et al. Spectrum-Integral Talbot Effect for UV Photolithography With Extended DOF[J]. IEEE PHOTONICS TECHNOLOGY LETTERS,2015,27(20):2201-2204.
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