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题名:
深紫外波段光学薄膜制备技术研究
作者: 田俊林
学位类别: 硕士
答辩日期: 2009-05-25
授予单位: 中国科学院光电技术研究所
授予地点: 光电技术研究所
导师: 申林
关键词: 光学薄膜 ; 深紫外 ; ; 氟化物 ; 增透膜 ; 高反膜 ; 热蒸发
其他题名: Research on fabrication of optical thin-film coatings in deep ultra-violet spectral range
学位专业: 光学工程
中文摘要: 随着激光技术的不断发展,以准分子激光器、自由电子激光器以及全固态深紫外激光器为代表的深紫外激光光源相继出现。这些深紫外激光光源在微电子器件制造、材料微细加工、深紫外激光光谱、生物医学工程等领域都有着非常广阔的应用前景。 深紫外激光光源的快速发展及广泛应用对深紫外波段光学薄膜提出了迫切的要求。这些要求包括光谱性能、机械性能、环境稳定性能、抗激光损伤性能等等。 当前,能够应用于深紫外波段的镀膜材料主要包括金属铝、高带宽氧化物以及氟化物。由于氧化物材料的吸收边较长,不适宜应用于深紫外波段的短波范围,因此本文主要研究介质增强型铝镜以及全介质氟化物薄膜元件的设计与制备。其中,氟化物材料包括AlF3、MgF2、LaF3和GdF3。 本文利用Essential Macleod膜系设计软件对Al+MgF2组合在175~210nm波段范围内进行设计与优化。基于经改造的A700Q真空镀膜机采用热蒸发的方式制备了Al+MgF2组合的介质增强型铝镜,在190~210nm波段范围内,介质增强型铝镜的反射率达到82.5~84%。 利用Essential Macleod膜系设计软件对熔融石英和CaF2基片、AlF3和MgF2两种低折射率材料、LaF3和GdF3两种高折射率材料所构成的八种组合分别设计了193nm增透膜、177.3nm增透膜以及175~210nm波段宽带增透膜。基于ZZS800真空镀膜机,在紫外级熔融石英基片上,采用热舟蒸发的方式沉积紫外级AlF3和LaF3材料,镀制了利用Essential Macleod软件设计优化的宽带增透膜,在190~210nm波段范围内透过率达到94.68~97.81%。 利用Essential Macleod膜系设计软件对CaF2基片、AlF3和MgF2两种低折射率材料、LaF3和GdF3两种高折射率材料所构成的四种组合分别设计了193nm高反膜和177.3nm高反膜。
英文摘要: With the development of laser technologies, deep-ultra violet (DUV) light sources, especially excimer lasers, free electron lasers, and solid state lasers have shown widespread potential for a great many applications such as the fabrication of micro-electronic devices, precision material processing, laser spectrum in DUV, and biomedicine engineering. On going into the DUV spectral region, stringent requirements are put forward in the operation of the DUV light sources and their applications, including spectral properties, mechanical stabilities, environmental stabilities, and laser resistance. In the DUV spectral range, the number of materials that are suitable for the fabrication of thin-film coatings is very limited. These are metal aluminum, some wide band-gap oxides, and some fluorides. Due to their relatively longer cut-off wavelength, thus relatively more serious absorption, oxides are not capable to manufacture optical coatings in the short band of DUV spectrum. So we concentrate on the research of fluoride coating materials such as AlF3, MgF2, LaF3, and GdF3. Utilizing the Essential Macleod thin films design software, we design and optimize the MgF2-enhanced-aluminum coatings which provide high reflectivity above 90% in the wavelength range from 175 to 210nm. Based on the modified A700Q coating system, the enhanced-aluminum coatings are deposited by thermal evaporation. Reflectivity of 82.5~84% is achieved in our experiments. In the design and fabrication of anti-reflection coatings, fused silica and UV-grade CaF2 are selected as substrates, AlF3 and MgF2 as low refractive index materials, LaF3 and GdF3 as high refractive index materials. Thus, eight different combinations are designed. Three different types of antireflection coatings are involved: AR-coatings at 193nm, AR-coatings at 177.3nm, and wideband AR-coatings in the wavelength range from 175 to 210nm. The wideband AR-coatings are deposited using the ZZS800 coating system by thermal boat evaporation. The measured transmittance reaches to 94.68~97.81% in the range of 190~210nm. Also, high reflectance coatings at 193nm and at 177.3nm are designed and optimized.
语种: 中文
内容类型: 学位论文
URI标识: http://ir.ioe.ac.cn/handle/181551/363
Appears in Collections:光电技术研究所博硕士论文_学位论文

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Recommended Citation:
田俊林. 深紫外波段光学薄膜制备技术研究[D]. 光电技术研究所. 中国科学院光电技术研究所. 2009.
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